Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 14/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 14/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 13/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 7/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | MPI | P34949 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11964296 | 0.90 | SLC6A2 (0.33) | SLC6A2SLC6A4CYP2D6SLC6A3ALDH1A1 | |
| SCHEMBL19335269 | 0.81 | SLC6A2 (0.41) | SLC6A2SLC6A4CYP2D6SLC6A3ALDH1A1 | |
| SCHEMBL16974322 | 0.80 | POLB (0.49) | SLC6A2SLC6A4CYP2D6SLC6A3ALDH1A1 | |
| SCHEMBL2192132 | 0.78 | CYP2D6 (0.35) | SLC6A2SLC6A4CYP2D6SLC6A3ALDH1A1 | |
| SCHEMBL18241637 | 0.74 | MAPT (0.38) | SLC6A2SLC6A4CYP2D6SLC6A3ALDH1A1 | |
| SCHEMBL9610354 | 0.72 | TSHR (0.37) | SLC6A2SLC6A4CYP2D6SLC6A3ALDH1A1 | |
| SCHEMBL12416516 | 0.72 | SLC6A2 (0.38) | SLC6A2SLC6A4CYP2D6SLC6A3ALDH1A1 | |
| SCHEMBL12415889 | 0.72 | CA1 (0.37) | SLC6A2SLC6A4CYP2D6SLC6A3ALDH1A1 | |
| SCHEMBL9610485 | 0.67 | MTNR1A (0.39) | ALDH1A1 | |
| SCHEMBL9610362 | 0.67 | TAS1R3 (0.42) | SLC6A2SLC6A4CYP2D6ALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8735046-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8735046-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |