SCHEMBL12415889

SCHEMBL12415889

C=C(C)C(=O)OCCOC1c2ccccc2CC1(C)C

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.37
CA2 P00918 2/20 0.37
THRB P10828 1/20 0.36
CYP2D6 P10635 10/20 0.34
SLC6A2 P23975 10/20 0.34
SLC6A4 P31645 10/20 0.34
HTT P42858 2/20 0.34
POLB P06746 1/20 0.34
APEX1 P27695 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
SLC6A3 Q01959 5/20 0.33
ALDH1A1 P00352 2/20 0.33
LMNA P02545 1/20 0.33
GAA P10253 1/20 0.33
MAPT P10636 1/20 0.33
HPGD P15428 1/20 0.33
MPI P34949 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
BRD4 O60885 1/20 0.33
TSHR P16473 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11964296 0.82 SLC6A2 (0.33) CYP2D6SLC6A2SLC6A4HTTSLC6A3
SCHEMBL2192132 0.82 CYP2D6 (0.35) CYP2D6SLC6A2SLC6A4POLBSLC6A3
SCHEMBL16858730 0.77 THRB (0.40) CA1CA2THRBHTTPOLB
SCHEMBL16974322 0.73 POLB (0.49) CYP2D6SLC6A2SLC6A4POLBSLC6A3
SCHEMBL9610355 0.72 SLC6A2 (0.34) CYP2D6SLC6A2SLC6A4HTTSLC6A3
SCHEMBL9610365 0.70 SLC6A2 (0.34) CYP2D6SLC6A2SLC6A4POLBSLC6A3
SCHEMBL19335269 0.70 SLC6A2 (0.41) CYP2D6SLC6A2SLC6A4SLC6A3ALDH1A1
SCHEMBL9610398 0.69 ALDH1A1 (0.33) CYP2D6SLC6A2SLC6A4HTTPOLB
SCHEMBL2194689 0.69 PIN1 (0.36) POLBALDH1A1LMNAHPGDSMN1; SMN2
SCHEMBL18355101 0.69 THRB (0.40) CA1CA2THRBHTTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed
US-20160363866-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-15 US disclosed
US-20160363866-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-15 US disclosed
US-9023586-B2 Positive resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-05-05 US disclosed
US-9023586-B2 Positive resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-05-05 US disclosed
US-8846303-B2 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US disclosed
US-8846303-B2 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US disclosed
US-20140170563-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-19 US disclosed
US-20140170563-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-19 US disclosed
US-8501384-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-06 US disclosed
US-8501384-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-06 US disclosed
US-20130089820-A1 RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-11 US disclosed
US-20130089820-A1 RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-11 US disclosed
US-20110171580-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-14 US disclosed
US-20110171580-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130089820-A1 RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS PSMB2, PSMC6, PSMB1 CA1 3683/4885CA2 4115/4885THRB 323/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.