Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.30 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9610465 | 0.96 | PDK2 (0.31) | MEN1MAPTKMT2ANPSR1 | |
| SCHEMBL9610464 | 0.96 | PDK2 (0.31) | MEN1MAPTKMT2ANPSR1 | |
| SCHEMBL9610474 | 0.89 | CNR1 (0.31) | — | |
| SCHEMBL9610458 | 0.85 | MEN1 (0.33) | MEN1MAPTKMT2ANPSR1 | |
| SCHEMBL9610467 | 0.85 | ALDH1A1 (0.40) | — | |
| SCHEMBL9610473 | 0.84 | SLC6A4 (0.32) | — | |
| SCHEMBL9610459 | 0.83 | PDK2 (0.32) | MEN1MAPTKMT2ANPSR1 | |
| SCHEMBL9610463 | 0.82 | PER2 (0.33) | — | |
| SCHEMBL9610475 | 0.82 | MEN1 (0.31) | MEN1MAPTKMT2ANPSR1 | |
| SCHEMBL9610476 | 0.82 | ALDH1A1 (0.36) | MEN1MAPTKMT2ANPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8735046-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8735046-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |