SCHEMBL9610476

SCHEMBL9610476

C=C(C)C(=O)OC1(Cc2ccccc2)c2ccccc2-c2cccc3cccc1c23

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.36
NPSR1 Q6W5P4 3/20 0.34
KDM4E B2RXH2 4/20 0.33
HSD17B10 Q99714 3/20 0.33
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
HPGD P15428 2/20 0.33
ELANE P08246 1/20 0.33
MAPT P10636 5/20 0.33
GAA P10253 1/20 0.33
RAB9A P51151 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
AVPR1A P37288 1/20 0.32
CYP1A2 P05177 1/20 0.32
AKR1B1 P15121 1/20 0.32
ALOX15 P16050 1/20 0.32
LMNA P02545 1/20 0.31
APEX1 P27695 1/20 0.31
TDP1 Q9NUW8 2/20 0.31
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9610469 0.87 TXNRD1 (0.32)
SCHEMBL9610458 0.87 MEN1 (0.33) ALDH1A1NPSR1KDM4EHSD17B10MEN1
SCHEMBL9610459 0.85 PDK2 (0.32) ALDH1A1NPSR1KDM4EHSD17B10MEN1
SCHEMBL9610544 0.84 KCNQ2 (0.40) ALDH1A1MEN1KMT2AELANEMAPT
SCHEMBL9610475 0.84 MEN1 (0.31) ALDH1A1NPSR1KDM4EHSD17B10MEN1
SCHEMBL9610472 0.84 MEN1 (0.31) ALDH1A1NPSR1KDM4EHSD17B10MEN1
SCHEMBL9610468 0.84 ALDH1A1 (0.38) ALDH1A1NPSR1KDM4EHSD17B10MEN1
SCHEMBL9610462 0.83 TDP1 (0.34) NPSR1MEN1KMT2AELANEMAPT
SCHEMBL9610461 0.82 MEN1 (0.32) NPSR1MEN1KMT2AMAPT
SCHEMBL9610470 0.82 PDK2 (0.32) NPSR1MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8735046-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-05-27 US disclosed
US-8735046-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-05-27 US disclosed
US-20120135349-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-31 US disclosed
US-20120135349-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-31 US disclosed