Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.31 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.31 |
| ▸ | CASP1 | P29466 | 1/20 | 0.31 |
| ▸ | CASP7 | P55210 | 1/20 | 0.31 |
| ▸ | KIF11 | P52732 | 1/20 | 0.30 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9610458 | 0.87 | MEN1 (0.33) | MEN1KMT2AMAPTNPSR1ELANE | |
| SCHEMBL9610459 | 0.85 | PDK2 (0.32) | MEN1KMT2AMAPTNPSR1ELANE | |
| SCHEMBL9610475 | 0.84 | MEN1 (0.31) | MEN1KMT2AMAPTNPSR1ELANE | |
| SCHEMBL9610476 | 0.84 | ALDH1A1 (0.36) | MEN1KMT2AMAPTNPSR1ELANE | |
| SCHEMBL11964310 | 0.83 | ALDH1A1 (0.33) | MEN1KMT2AMAPTNPSR1ELANE | |
| SCHEMBL9610462 | 0.83 | TDP1 (0.34) | MEN1KMT2AMAPTNPSR1ELANE | |
| SCHEMBL9610461 | 0.82 | MEN1 (0.32) | MEN1KMT2AMAPTNPSR1 | |
| SCHEMBL9610470 | 0.82 | PDK2 (0.32) | MEN1KMT2AMAPTNPSR1PDK2 | |
| SCHEMBL9610471 | 0.81 | — | — | |
| SCHEMBL9610464 | 0.80 | PDK2 (0.31) | MEN1KMT2AMAPTNPSR1PDK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8735046-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8735046-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120135349-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |