⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9612213 | 0.89 | — | — | |
| SCHEMBL9610796 | 0.86 | — | — | |
| SCHEMBL16807921 | 0.84 | — | — | |
| SCHEMBL9610771 | 0.80 | HSD11B1 (0.33) | — | |
| SCHEMBL16807918 | 0.77 | — | — | |
| SCHEMBL9612212 | 0.76 | — | — | |
| SCHEMBL9610794 | 0.75 | CA2 (0.32) | — | |
| SCHEMBL10186036 | 0.74 | CYP19A1 (0.31) | — | |
| SCHEMBL9610786 | 0.73 | PABPC1 (0.42) | — | |
| SCHEMBL16810568 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8420294-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-04-16 | — | — | US | disclosed |
| US-20120135351-A1 | SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-31 | — | — | US | disclosed |