⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4374684 | 0.88 | — | — | |
| SCHEMBL581061 | 0.86 | — | — | |
| SCHEMBL9757072 | 0.86 | — | — | |
| SCHEMBL9653989 | 0.83 | — | — | |
| SCHEMBL581028 | 0.80 | LMNA (0.34) | — | |
| SCHEMBL15845081 | 0.79 | — | — | |
| SCHEMBL15844860 | 0.79 | CDC25A (0.32) | — | |
| SCHEMBL8977907 | 0.79 | — | — | |
| SCHEMBL1467428 | 0.79 | — | — | |
| SCHEMBL961347 | 0.79 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3340252-A1 | ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| EP-3340253-A1 | UV-RESISTANT ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| US-6740173-B1 | FILM-FORMING BINDER, AT LEAST A CORROSION INHIBITING ADDITIVE REACTIVE WITH METAL AND AT LEAST AN OLIGOMER ADDITIVE BEARING PHOSPHONIC ACIDS | ATOFINA (FR) | 2004-05-25 | — | — | US | claimed |
| CN-107209303-B | Far infrared ray reflective film, dispersion for forming far infrared ray reflective film, method for producing far infrared ray reflective film, far infrared ray reflective glass, and window | 富士胶片株式会社 | 2020-07-14 | — | — | CN | disclosed |
| US-10589494-B2 | Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window | FUJIFILM CORPORATION (JP) | 2020-03-17 | — | — | US | disclosed |
| EP-3340252-A1 | ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | disclosed |
| EP-3340253-A1 | UV-RESISTANT ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | disclosed |
| US-20180079917-A1 | HEAT INSULATION PAINT | FUJIFILM CORPORATION (JP) | 2018-03-22 | — | — | US | disclosed |
| US-20170320302-A1 | FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW | FUJIFILM CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| EP-3125323-A1 | SOLAR CELL | Fujifilm Corporation (JP) | 2017-02-01 | — | — | EP | disclosed |
| US-20170005282-A1 | SOLAR CELL | FUJIFILM CORPORATION (JP) | 2017-01-05 | — | — | US | disclosed |
| US-5218014-A | Graft polymer formed by graft polymerization of vinyl monomer onto colloidal silica core silicone shell particles | TOSHIBA SILICONE CO., LTD. (JP) | 1993-06-08 | — | — | US | disclosed |
| US-5188899-A | SILICA-CORE SILICONE-SHELL PARTICLES, EMULSION CONTAINING THE SAME DISPERSED THEREIN, AND PROCESS FOR PRODUCING THE EMULSION | TOSHIBA SILICONE CO., LTD. (JP) | 1993-02-23 | — | — | US | disclosed |
| EP-0222157-B1 | RESIN COMPOSITION | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1992-12-30 | — | — | EP | disclosed |
| EP-0433906-A2 | Thermoplastic resin and process for producing the same | TOSHIBA SILICONE CO., LTD. (JP) | 1991-06-26 | — | — | EP | disclosed |
| EP-0433727-A1 | Silica-core silicone-shell particles, emulsion containing the same dispersed therein, and process for producing the emulsion | TOSHIBA SILICONE CO., LTD. (JP) | 1991-06-26 | — | — | EP | disclosed |
| US-5021266-A | Silicon based protective coating | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1991-06-04 | — | — | US | disclosed |
| US-4960809-A | CURABLE MIXTURE OF ALKOXYSILYL-CONTAINING ADDITION COPOLYMER AND AN AMIDATED POLYMER OF AN AMINE-CONTAINING ALKOXYSILANE AND SILYLATING AGENT; ADHESION TO SILICONE OVERCOATINGS AND POLYCARBONATE SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1990-10-02 | — | — | US | disclosed |
| US-4886862-A | MOISTURE-CURABLE SILYL-GROUP CONTAINING COPOLYMER OF A FLUOROALKYL PERVINYL ETHER AND A VINYL CARBOXYLATE, CATALYST AND SOLVENT; PAINTS; COATINGS, WEATHERPROOFING; HARDNESS | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1989-12-12 | — | — | US | disclosed |
| EP-0222157-A2 | Resin composition | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1987-05-20 | — | — | EP | disclosed |