SCHEMBL9615294

SCHEMBL9615294

CC(O)OC(C)Oc1ccc(C(C)(C)c2ccc(OC(C)OC(C)O)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HIF1A Q16665 2/20 0.41
HTT P42858 2/20 0.41
AR P10275 2/20 0.40
HPGD P15428 3/20 0.39
TSHR P16473 3/20 0.39
ESR1 P03372 3/20 0.39
ESR2 Q92731 3/20 0.39
CYP3A4 P08684 2/20 0.39
SLC6A2 P23975 1/20 0.39
SLC6A4 P31645 1/20 0.39
HTR6 P50406 1/20 0.39
ESRRG P62508 1/20 0.39
SLC6A3 Q01959 1/20 0.39
HSD17B10 Q99714 1/20 0.39
ALDH1A1 P00352 4/20 0.35
KDM4E B2RXH2 4/20 0.35
TDP1 Q9NUW8 1/20 0.35
PARP10 Q53GL7 1/20 0.34
KMT2A Q03164 3/20 0.34
TP53 P04637 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL333514 0.84 HIF1A (0.45) HIF1AHTTARHPGDTSHR
SCHEMBL6273128 0.80 HPGD (0.39) HIF1AHTTARHPGDTSHR
SCHEMBL16378880 0.78 TAS1R3 (0.43) HIF1AHTTARHPGDTSHR
SCHEMBL9457222 0.78 ESR1 (0.59) HIF1AHTTARHPGDTSHR
SCHEMBL6515056 0.78 ALDH1A1 (0.52) HIF1AHTTESR1ESR2CYP3A4
SCHEMBL17024119 0.77 HIF1A (0.42) HIF1AHTTARHPGDTSHR
SCHEMBL2771834 0.77 PARP10 (0.36) SLC6A4TDP1PARP10KMT2ACYP1A2
SCHEMBL8942092 0.77 TDP1 (0.41) HPGDTSHRCYP3A4ALDH1A1TDP1
SCHEMBL13717569 0.76 ESR2 (0.57) HIF1AHTTARHPGDTSHR
SCHEMBL3169797 0.76 LMNA (0.45) HPGDTSHRCYP3A4HSD17B10ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2634297-B1 BIOMASS-DERIVED POLYESTER SHORT FIBERS AND WET NONWOVEN FABRIC FORMED FROM SAME TEIJIN LTD (JP) 2017-12-06 EP disclosed
US-9062399-B2 Biomass-derived polyester wet-laid nonwoven fabric TEIJIN LIMITED (JP) 2015-06-23 US disclosed
US-20140235128-A1 BIOMASS-DERIVED POLYESTER WET-LAID NONWOVEN FABRIC TEIJIN LIMITED (JP) 2014-08-21 US disclosed
US-8741103-B2 Biomass-derived polyester staple fibers and wet-laid nonwoven fabric formed from the same TEIJIN LIMITED (JP) 2014-06-03 US disclosed
EP-2634297-A1 BIOMASS-DERIVED POLYESTER SHORT FIBERS AND WET NONWOVEN FABRIC FORMED FROM SAME Teijin Limited (JP) 2013-09-04 EP disclosed
US-20130199744-A1 BIOMASS-DERIVED POLYESTER STAPLE FIBERS AND WET-LAID NONWOVEN FABRIC FORMED FROM THE SAME TEIJIN LIMITED (JP) 2013-08-08 US disclosed
US-5093172-A Wear resistance FUJI PHOTO FILM CO., LTD. (JP) 1992-03-03 US disclosed
US-5068145-A Magnetic recording medium in which the magnetic layer contains a vinyl compound having an inner salt of an alkyl amino alkyl group FUJI PHOTO FILM CO., LTD. (JP) 1991-11-26 US disclosed
US-5061564-A Durability; heat and humidity resistance; surface smoothness FUJI PHOTO FILM CO., LTD. (JP) 1991-10-29 US disclosed
US-5049448-A Magnetic recording medium containing an ester lubricant branched from the number 2 carbon position of the acid residue FUJI PHOTO FILM CO., LTD. (JP) 1991-09-17 US disclosed
US-4976989-A COATING, ON NONMAGNETIC SUPPORT, MAGNETIC LAYER CONTAINING FERROMAGNETIC PARTICLES AND RADIATION POLYMERIZABLE BINDER, ORIENTING, DRYING, CALENDERING, EXPOSING TO RADIATION BEFORE WINDING UP FUJI PHOTO FILM CO., LTD. (JP) 1990-12-11 US disclosed
US-4959263-A HIGH TEMPERATURE, HIGH HUMIDITY OXIDATION RESISTANCE FUJI PHOTO FILM CO., LTD. (JP) 1990-09-25 US disclosed
US-4788103-A FERROMAGNETIC PARTICLES IN MODIFIED POLYURETHANE BINDER FUJI PHOTO FILM CO., LTD. (JP) 1988-11-29 US disclosed
US-4657817-A POLYESTER URETHANE ACRYLATES HARDENED BY IRRADIATION; WEAR RESISTANCE FUJI PHOTO FILM CO., LTD. (JP) 1987-04-14 US disclosed
US-4576866-A VINYL ACETATE-VINYL CHLORIDE COPOLYMER FUJI PHOTO FILM CO., LTD. (JP) 1986-03-18 US disclosed