SCHEMBL9616808

SCHEMBL9616808

C=CC(C=C)(OC(C=C)(C=C)S(=O)(=O)O)S(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3341766 0.72
SCHEMBL8522233 0.65
SCHEMBL634628 0.63
SCHEMBL2468239 0.63
SCHEMBL9958272 0.63
SCHEMBL8522994 0.63
SCHEMBL15900047 0.61
SCHEMBL27361461 0.61
Sulfuric Acid SCHEMBL28799289 0.61 CA5A (0.40)
Trifluoromethanesulfonic Acid SCHEMBL7781126 0.59 ALDH1A1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-H1063-H Containing hydrazine compound for high contrast image by fast processing KONICA CORPORATION, A CORP. OF JAPAN (JP) 1992-06-02 US disclosed
EP-0368229-A2 Negative type light-sensitive halide photographic material KONICA CORPORATION (JP) 1990-05-16 EP disclosed