Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PABPC1 | P11940 | 1/20 | 0.35 |
| ▸ | EIF4H | Q15056 | 1/20 | 0.35 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9622357 | 0.99 | PABPC1 (0.36) | PABPC1EIF4HCTDSP1KDM4EALDH1A1 | |
| SCHEMBL9622988 | 0.85 | HTT (0.42) | PABPC1EIF4HCTDSP1KDM4EALDH1A1 | |
| SCHEMBL9623094 | 0.83 | HTT (0.40) | PABPC1EIF4HCTDSP1KDM4EALDH1A1 | |
| SCHEMBL2326852 | 0.80 | LMNA (0.35) | PABPC1KDM4EALDH1A1LMNAL3MBTL1 | |
| Iodide SCHEMBL3941507 | 0.78 | LMNA (0.34) | PABPC1KDM4EALDH1A1HTTLMNA | |
| SCHEMBL9623269 | 0.76 | KDM4E (0.40) | PABPC1EIF4HCTDSP1KDM4EALDH1A1 | |
| SCHEMBL10700976 | 0.76 | KDM4E (0.40) | PABPC1EIF4HCTDSP1KDM4EALDH1A1 | |
| SCHEMBL295434 | 0.76 | LMNA (0.40) | PABPC1EIF4HCTDSP1KDM4EALDH1A1 | |
| Toluene SCHEMBL29011424 | 0.75 | MCHR1 (0.43) | PABPC1EIF4HCTDSP1KDM4EALDH1A1 | |
| SCHEMBL9622676 | 0.75 | HTT (0.44) | PABPC1EIF4HCTDSP1KDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0291880-B1 | PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM | BASF Aktiengesellschaft (DE) | 1992-03-25 | — | — | EP | disclosed |
| EP-0291878-B1 | PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM | BASF Aktiengesellschaft (DE) | 1992-03-11 | — | — | EP | disclosed |
| EP-0291879-B1 | PHOTOPOLYMERISABLE RECORDING MATERIALS AS WELL AS PHOTORESIST LAYERS AND PLANOGRAPHIC PRINTING PLATES ON A BASIS OF THESE RECORDING MATERIALS AS WELL AS QUINAZOLONE-4 COMPOUNDS | BASF Aktiengesellschaft (DE) | 1990-11-07 | — | — | EP | disclosed |
| US-4962011-A | Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon | BASF AKTIENGESELLSCHAFT (DE) | 1990-10-09 | — | — | US | disclosed |
| US-4940649-A | Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon | BASF AKTIENGESELLSCHAFT (DE) | 1990-07-10 | — | — | US | disclosed |
| US-4908448-A | 4-Quinazolone compounds | BASF AKTIENGESELLSCHAFT (DE) | 1990-03-13 | — | — | US | disclosed |
| US-4891301-A | AS SENSITIZERS | BASF AKTIENGESELLSCHAFT (DE) | 1990-01-02 | — | — | US | disclosed |
| EP-0291880-A2 | Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |
| EP-0291879-A1 | Photopolymerisable recording materials as well as photoresist layers and planographic printing plates on a basis of these recording materials as well as quinazolone-4 compounds | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |
| EP-0291878-A2 | Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |
| EP-0291861-A2 | Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |