SCHEMBL962297

SCHEMBL962297

CO[Si](C)(CCCOC(=O)c1ccccc1)OC

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.64
LMNA P02545 2/20 0.56
TSHR P16473 3/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
KCNA3 P22001 1/20 0.45
MAPK1 P28482 2/20 0.45
HIF1A Q16665 1/20 0.45
SLC6A2 P23975 1/20 0.45
SLC6A3 Q01959 1/20 0.45
KMT2A Q03164 1/20 0.45
SMN1; SMN2 Q16637 2/20 0.44
SCN1A P35498 1/20 0.44
SCN2A Q99250 1/20 0.44
SCN3A Q9NY46 1/20 0.44
ESR1 P03372 1/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2D6 P10635 1/20 0.44
CYP2C19 P33261 1/20 0.44
NR1H2 P55055 1/20 0.44
RNASEL Q05823 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6273987 0.88 TDP1 (0.64) TDP1LMNATSHRL3MBTL1MAPK1
SCHEMBL6049371 0.86 TDP1 (0.62) TDP1LMNATSHRL3MBTL1MAPK1
SCHEMBL3918074 0.86 ALDH1A1 (0.45) TDP1LMNATSHRL3MBTL1MAPK1
SCHEMBL82898 0.86 TDP1 (0.66) TDP1LMNATSHRL3MBTL1MAPK1
SCHEMBL7216069 0.85 TDP1 (0.60) TDP1LMNATSHRL3MBTL1MAPK1
SCHEMBL1805287 0.83 TDP1 (0.62) TDP1LMNATSHRL3MBTL1MAPK1
SCHEMBL17726138 0.83 ADRB2 (0.49) TDP1LMNAKMT2AALDH1A1
SCHEMBL26455392 0.83 TDP1 (0.66) TDP1LMNATSHRL3MBTL1MAPK1
SCHEMBL26454774 0.83 TDP1 (0.66) TDP1LMNATSHRL3MBTL1MAPK1
SCHEMBL1270509 0.81 TSHR (0.42) TDP1LMNATSHRMAPK1SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
US-10589494-B2 Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window FUJIFILM CORPORATION (JP) 2020-03-17 US disclosed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
US-20180079917-A1 HEAT INSULATION PAINT FUJIFILM CORPORATION (JP) 2018-03-22 US disclosed
US-20170320302-A1 FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW FUJIFILM CORPORATION (JP) 2017-11-09 US disclosed
US-20150004327-A1 CONDUCTIVE MEMBER AND METHOD FOR MANUFACTURING SAME FUJIFILM CORPORATION (JP) 2015-01-01 US disclosed
US-20140069488-A1 CONDUCTIVE MEMBER, METHOD OF PRODUCING THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-03-13 US disclosed
US-20140048131-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-20 US disclosed
US-20140034360-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-06 US disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
WO-2005103061-A1 METHOD OF MANUFACTURING AN ORGANOALKOXYSILANE HAVING ESTER-FUNCTIONAL GROUPS DOW CORNING TORAY CO., LTD. (JP) 2005-11-03 WO disclosed