Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.34 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.34 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.34 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.34 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | APP | P05067 | 2/20 | 0.32 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2327075 | 0.98 | NPC1 (0.39) | NPC1POLBRAB9ASMN1; SMN2KMT2A | |
| Iodide SCHEMBL5760651 | 0.96 | NPC1 (0.38) | NPC1POLBRAB9ASMN1; SMN2KMT2A | |
| SCHEMBL29743232 | 0.90 | NPC1 (0.35) | NPC1POLBRAB9ASMN1; SMN2GABRG2 | |
| SCHEMBL9622921 | 0.90 | SMN1; SMN2 (0.35) | NPC1POLBRAB9ASMN1; SMN2GABRG2 | |
| SCHEMBL9849539 | 0.84 | NPC1 (0.32) | NPC1POLBRAB9ASMN1; SMN2GABRG2 | |
| Bromide SCHEMBL11311820 | 0.82 | NPC1 (0.46) | NPC1POLBRAB9ASMN1; SMN2KMT2A | |
| SCHEMBL9623239 | 0.79 | LMNA (0.43) | SMN1; SMN2KMT2A | |
| Bromide SCHEMBL8988090 | 0.79 | TSHR (0.40) | NPC1POLBRAB9ASMN1; SMN2TSHR | |
| SCHEMBL2402517 | 0.78 | APP (0.34) | NPC1POLBRAB9ASMN1; SMN2KMT2A | |
| SCHEMBL7036815 | 0.78 | GABRG2 (0.32) | NPC1POLBRAB9ASMN1; SMN2GABRG2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0291880-B1 | PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM | BASF Aktiengesellschaft (DE) | 1992-03-25 | — | — | EP | disclosed |
| EP-0291878-B1 | PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM | BASF Aktiengesellschaft (DE) | 1992-03-11 | — | — | EP | disclosed |
| EP-0291879-B1 | PHOTOPOLYMERISABLE RECORDING MATERIALS AS WELL AS PHOTORESIST LAYERS AND PLANOGRAPHIC PRINTING PLATES ON A BASIS OF THESE RECORDING MATERIALS AS WELL AS QUINAZOLONE-4 COMPOUNDS | BASF Aktiengesellschaft (DE) | 1990-11-07 | — | — | EP | disclosed |
| US-4962011-A | Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon | BASF AKTIENGESELLSCHAFT (DE) | 1990-10-09 | — | — | US | disclosed |
| US-4940649-A | Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon | BASF AKTIENGESELLSCHAFT (DE) | 1990-07-10 | — | — | US | disclosed |
| US-4908448-A | 4-Quinazolone compounds | BASF AKTIENGESELLSCHAFT (DE) | 1990-03-13 | — | — | US | disclosed |
| US-4891301-A | AS SENSITIZERS | BASF AKTIENGESELLSCHAFT (DE) | 1990-01-02 | — | — | US | disclosed |
| EP-0291880-A2 | Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |
| EP-0291878-A2 | Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |
| EP-0291861-A2 | Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |
| EP-0291879-A1 | Photopolymerisable recording materials as well as photoresist layers and planographic printing plates on a basis of these recording materials as well as quinazolone-4 compounds | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |