Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 6/20 | 0.43 |
| ▸ | HTT | P42858 | 3/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | THPO | P40225 | 1/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | CA9 | Q16790 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.35 |
| ▸ | CNR2 | P34972 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL236308 | 0.84 | LMNA (0.45) | LMNAHTTSMN1; SMN2CYP3A4CYP2D6 | |
| SCHEMBL2327075 | 0.81 | NPC1 (0.39) | SMN1; SMN2KMT2A | |
| SCHEMBL9622937 | 0.80 | LMNA (0.40) | LMNAHTTSMN1; SMN2CYP3A4CYP2D6 | |
| Bromide SCHEMBL9623049 | 0.79 | NPC1 (0.42) | SMN1; SMN2KMT2A | |
| Iodide SCHEMBL5760651 | 0.79 | NPC1 (0.38) | SMN1; SMN2KMT2A | |
| SCHEMBL9622389 | 0.78 | KDM4E (0.41) | ALDH1A1KDM4EMAPTGAA | |
| SCHEMBL10700976 | 0.77 | KDM4E (0.40) | LMNAHTTMAPK1ALDH1A1KDM4E | |
| SCHEMBL9623269 | 0.77 | KDM4E (0.40) | LMNAHTTMAPK1ALDH1A1KDM4E | |
| SCHEMBL9500996 | 0.76 | SMN1; SMN2 (0.38) | LMNAHTTSMN1; SMN2MAPK1KMT2A | |
| SCHEMBL9849539 | 0.76 | NPC1 (0.32) | SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0291880-B1 | PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM | BASF Aktiengesellschaft (DE) | 1992-03-25 | — | — | EP | disclosed |
| EP-0291878-B1 | PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM | BASF Aktiengesellschaft (DE) | 1992-03-11 | — | — | EP | disclosed |
| EP-0441232-A2 | Cationic photopolymerisation process | BASF Aktiengesellschaft (DE) | 1991-08-14 | — | — | EP | disclosed |
| EP-0291879-B1 | PHOTOPOLYMERISABLE RECORDING MATERIALS AS WELL AS PHOTORESIST LAYERS AND PLANOGRAPHIC PRINTING PLATES ON A BASIS OF THESE RECORDING MATERIALS AS WELL AS QUINAZOLONE-4 COMPOUNDS | BASF Aktiengesellschaft (DE) | 1990-11-07 | — | — | EP | disclosed |
| US-4962011-A | Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon | BASF AKTIENGESELLSCHAFT (DE) | 1990-10-09 | — | — | US | disclosed |
| US-4940649-A | Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon | BASF AKTIENGESELLSCHAFT (DE) | 1990-07-10 | — | — | US | disclosed |
| US-4908448-A | 4-Quinazolone compounds | BASF AKTIENGESELLSCHAFT (DE) | 1990-03-13 | — | — | US | disclosed |
| US-4891301-A | AS SENSITIZERS | BASF AKTIENGESELLSCHAFT (DE) | 1990-01-02 | — | — | US | disclosed |
| US-4886735-A | Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon | BASF AKTIENGESELLSCHAFT (DE) | 1989-12-12 | — | — | US | disclosed |
| EP-0291880-A2 | Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |
| EP-0291878-A2 | Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |
| EP-0291879-A1 | Photopolymerisable recording materials as well as photoresist layers and planographic printing plates on a basis of these recording materials as well as quinazolone-4 compounds | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |
| EP-0291861-A2 | Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom | BASF Aktiengesellschaft (DE) | 1988-11-23 | — | — | EP | disclosed |