SCHEMBL9622389

SCHEMBL9622389

CCCCCS(=O)(=O)[O-].CCO[n+]1ccccc1C

nearest known ligand 0.41

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.41
ALDH1A1 P00352 4/20 0.41
RXFP1 Q9HBX9 1/20 0.41
HPGD P15428 2/20 0.39
GAA P10253 1/20 0.39
PABPC1 P11940 1/20 0.39
EIF4H Q15056 1/20 0.39
CTDSP1 Q9GZU7 1/20 0.39
POLB P06746 1/20 0.32
MAPT P10636 1/20 0.32
KCNH2 Q12809 6/20 0.32
EPHX2 P34913 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9623269 0.99 KDM4E (0.40) KDM4EALDH1A1RXFP1HPGDGAA
SCHEMBL10700976 0.99 KDM4E (0.40) KDM4EALDH1A1RXFP1HPGDGAA
SCHEMBL9622525 0.88 ALDH1A1 (0.42) KDM4EALDH1A1RXFP1HPGDGAA
SCHEMBL9622918 0.86 ALDH1A1 (0.41) KDM4EALDH1A1RXFP1HPGDGAA
SCHEMBL2327075 0.79 NPC1 (0.39) POLB
SCHEMBL9623239 0.78 LMNA (0.43) KDM4EALDH1A1GAAMAPT
Iodide SCHEMBL5760651 0.77 NPC1 (0.38) CTDSP1POLB
Bromide SCHEMBL9623049 0.77 NPC1 (0.42) POLB
SCHEMBL9623094 0.76 HTT (0.40) KDM4EALDH1A1RXFP1HPGDGAA
SCHEMBL11058081 0.76 NPC1 (0.36) KDM4EALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0291880-B1 PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM BASF Aktiengesellschaft (DE) 1992-03-25 EP disclosed
EP-0291878-B1 PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM BASF Aktiengesellschaft (DE) 1992-03-11 EP disclosed
EP-0291879-B1 PHOTOPOLYMERISABLE RECORDING MATERIALS AS WELL AS PHOTORESIST LAYERS AND PLANOGRAPHIC PRINTING PLATES ON A BASIS OF THESE RECORDING MATERIALS AS WELL AS QUINAZOLONE-4 COMPOUNDS BASF Aktiengesellschaft (DE) 1990-11-07 EP disclosed
US-4962011-A Photopolymerizable recording materials containing a triazole sensitizer and photoresist layers and lithographic printing plates based thereon BASF AKTIENGESELLSCHAFT (DE) 1990-10-09 US disclosed
US-4940649-A Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon BASF AKTIENGESELLSCHAFT (DE) 1990-07-10 US disclosed
US-4908448-A 4-Quinazolone compounds BASF AKTIENGESELLSCHAFT (DE) 1990-03-13 US disclosed
US-4891301-A AS SENSITIZERS BASF AKTIENGESELLSCHAFT (DE) 1990-01-02 US disclosed
EP-0291880-A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom BASF Aktiengesellschaft (DE) 1988-11-23 EP disclosed
EP-0291878-A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom BASF Aktiengesellschaft (DE) 1988-11-23 EP disclosed
EP-0291879-A1 Photopolymerisable recording materials as well as photoresist layers and planographic printing plates on a basis of these recording materials as well as quinazolone-4 compounds BASF Aktiengesellschaft (DE) 1988-11-23 EP disclosed
EP-0291861-A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom BASF Aktiengesellschaft (DE) 1988-11-23 EP disclosed