SCHEMBL962436

SCHEMBL962436

C=C(C)C(=O)OCc1ccccc1O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.47
AKR1B1 P15121 1/20 0.44
HSPA5 P11021 1/20 0.41
TSHR P16473 2/20 0.39
TYR P14679 1/20 0.39
CYBB P04839 1/20 0.38
ELANE P08246 1/20 0.38
ALDH1A1 P00352 1/20 0.38
KEAP1 Q14145 1/20 0.38
IAPP P10997 1/20 0.38
CYP2D6 P10635 1/20 0.37
HIF1A Q16665 1/20 0.37
POLB P06746 1/20 0.37
APEX1 P27695 1/20 0.37
HTT P42858 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA7 P43166 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoic Acid SCHEMBL28243752 0.91 POLB (0.47) IDO1AKR1B1TSHRTYRCYBB
SCHEMBL4202389 0.89 TSHR (0.44) TSHRELANEALDH1A1POLBAPEX1
SCHEMBL29577269 0.89 TSHR (0.44) TSHRELANEALDH1A1POLBAPEX1
SCHEMBL8988143 0.87 IAPP (0.50) TSHRCYBBIAPPCA12CA1
SCHEMBL31707533 0.84 ALDH1A1 (0.52) TSHRELANEALDH1A1POLBAPEX1
SCHEMBL1372181 0.84 THRB (0.42) TSHRELANEALDH1A1POLBAPEX1
SCHEMBL92277 0.84 CYBB (0.38) TSHRCYBBIAPPPOLBAPEX1
SCHEMBL716321 0.83 TYR (0.54) AKR1B1HSPA5TSHRTYRIAPP
SCHEMBL31744950 0.83 TYR (0.54) AKR1B1HSPA5TSHRTYRIAPP
SCHEMBL995952 0.83 CYP4F2 (0.45) TSHRCYBBELANEALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 332 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118108890-B G-line and h-line light absorption resin and preparation method thereof 广东粤港澳大湾区黄埔材料研究院 2024-07-02 CN claimed
CN-118108890-A G-line and h-line light absorption resin and preparation method thereof 广东粤港澳大湾区黄埔材料研究院 2024-05-31 CN claimed
CN-112745655-A Modified polyphenyl ether and polyethylene co-extrusion section bar and preparation method thereof 哈尔滨中大型材科技股份有限公司 2021-05-04 CN claimed
CN-105492971-B The method of the orientation of block copolymer mesoscopic structure is controlled by random copolymer 阿科玛法国公司 2019-09-10 CN claimed
CN-106167637-A Antifouling paint compositions, antifouling coat, antifouling base material and manufacture method thereof 中国涂料株式会社 2016-11-30 CN claimed
CN-1577129-A Gel organosol including amphipathic copolymeric binder having crosslinking functionality and liquid toners for electrophotographic applications SAMSUNG ELECTRONICS CO LTD (KR) 2005-02-09 CN claimed
CN-1398362-A Antireflective coating compsns. SHIPLEY CO LLC (US) 2003-02-19 CN claimed
US-5340888-A Curable mixture of phenolic novolak resin, esterified phenolic compound and base; for foundry molds, cores BORDEN INC. (US) 1994-08-23 US claimed
EP-0377308-B1 Phenolic resins BORDEN UK LTD (GB) 1993-11-03 EP claimed
US-5051454-A An esterified phenolic compound, an unesterified phenolic resole and a base and curing BORDEN, INC. (US) 1991-09-24 US claimed
EP-0377308-A1 Phenolic resins BORDEN (UK) LIMITED (GB) 1990-07-11 EP claimed
WO-1990006904-A2 PHENOLIC RESINS BORDEN (UK) LIMITED (GB) 1990-06-28 WO claimed
US-4369298-A Novel cured resin, process for production thereof, and lens composed of said resin from bis(alkyleneoxyphenyl)-diacrylate, bis(alkyleneoxyphenyl)diallyl ether, bis(alkyleneoxyphenyl)diallyl carbonate monomers TOKUYAMA SODA KABUSHIKI KAISHA (JP) 1983-01-18 US claimed
EP-4667537-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-12-24 EP disclosed
US-20250382500-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO LTD (JP) 2025-12-18 US disclosed
EP-3922673-B1 RESIN COMPOSITION, THERMOPLASTIC RESIN COMPOSITION, AND THERMOPLASTIC RESIN MOLDING NOF CORP (JP) 2025-04-02 EP disclosed
EP-0412570-A2 Light- and heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1991-02-13 EP disclosed
US-4649184-A UNSATURATED POLYSILOXANE COPOLYMER WITH MONOMER HAVING SIYLATED HYDROXYL GROUPS TOYO CONTACT LENS CO., LTD. (JP) 1987-03-10 US disclosed
EP-0184800-A2 Oxygen permeable soft contact lens material Toyo Contact Lens Co., Ltd. (JP) 1986-06-18 EP disclosed
US-4369298-A Novel cured resin, process for production thereof, and lens composed of said resin from bis(alkyleneoxyphenyl)-diacrylate, bis(alkyleneoxyphenyl)diallyl ether, bis(alkyleneoxyphenyl)diallyl carbonate monomers TOKUYAMA SODA KABUSHIKI KAISHA (JP) 1983-01-18 US disclosed