SCHEMBL9626470

SCHEMBL9626470

C=C(c1ccccc1O)C(C)C

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.45
KMT2A Q03164 3/20 0.45
NPC1 O15118 2/20 0.45
KDM4E B2RXH2 7/20 0.43
HPGD P15428 7/20 0.43
ALDH1A1 P00352 5/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
CA12 O43570 2/20 0.43
CA2 P00918 2/20 0.43
CA4 P22748 2/20 0.43
CA14 Q9ULX7 2/20 0.43
GABRA1 P14867 1/20 0.43
GABRB2 P47870 1/20 0.43
CA1 P00915 1/20 0.43
HMGB1 P09429 1/20 0.43
CA6 P23280 1/20 0.43
CA7 P43166 1/20 0.43
CA9 Q16790 1/20 0.43
NAPRT Q6XQN6 1/20 0.43
LMNA P02545 4/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24069734 0.79 CA1 (0.36) MEN1KMT2ANPC1KDM4EHPGD
SCHEMBL17208126 0.78 HSD17B10 (0.62) MEN1KMT2AKDM4EHPGDALDH1A1
SCHEMBL23836627 0.77 MAPT (0.46) ALDH1A1SMN1; SMN2CA12CA2CA1
SCHEMBL24015934 0.76 ALDH1A1 (0.44) KDM4EHPGDALDH1A1SMN1; SMN2TSHR
SCHEMBL22939346 0.76 MEN1 (0.37) MEN1KMT2AALDH1A1SMN1; SMN2LMNA
SCHEMBL19685318 0.74 MAPT (0.55) MEN1KMT2AKDM4EALDH1A1SMN1; SMN2
SCHEMBL208880 0.73 KMT2A (0.56) MEN1KMT2ANPC1KDM4EHPGD
SCHEMBL29349932 0.73 KMT2A (0.56) MEN1KMT2ANPC1KDM4EHPGD
SCHEMBL27516051 0.73 KMT2A (0.56) MEN1KMT2ANPC1KDM4EHPGD
SCHEMBL7175383 0.73 ALDH1A1 (0.48) MEN1KMT2ANPC1KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0202458-B1 CROSS-LINKED POLYALKENYL PHENOL BASED PHOTORESIST COMPOSITIONS International Business Machines Corporation (US) 1992-03-25 EP disclosed
EP-0202458-A2 Cross-linked polyalkenyl phenol based photoresist compositions International Business Machines Corporation (US) 1986-11-26 EP disclosed
US-4600683-A Cross-linked polyalkenyl phenol based photoresist compositions INTERNATIONAL BUSINESS MACHINES CORP. (US) 1986-07-15 US disclosed
US-4221700-A POLY(ALKYLATED ALKENYLPHENOL); POLYESTERS OF ALKYLTHIOALKANOIC ACIDS OR ORGANIC PHOSPHITE MARUZEN OIL CO., LTD. (JP) 1980-09-09 US disclosed