SCHEMBL9627145

SCHEMBL9627145

C=C(CCC)c1ccc(O)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B3 P37058 8/20 0.57
ESR1 P03372 8/20 0.55
ESR2 Q92731 4/20 0.55
MAPT P10636 3/20 0.48
CHRM1 P11229 3/20 0.48
SLC6A2 P23975 3/20 0.48
HSD17B10 Q99714 2/20 0.48
ALDH1A1 P00352 2/20 0.48
TSHR P16473 2/20 0.48
LMNA P02545 2/20 0.48
CYP1A2 P05177 2/20 0.48
PGR P06401 2/20 0.48
CHRM2 P08172 2/20 0.48
CYP3A4 P08684 2/20 0.48
ADORA3 P0DMS8 2/20 0.48
AR P10275 2/20 0.48
CYP2D6 P10635 2/20 0.48
CYP2C9 P11712 2/20 0.48
ALOX15 P16050 2/20 0.48
DRD1 P21728 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7187984 0.87 HSD17B3 (0.60) HSD17B3ESR1ESR2MAPTCHRM1
SCHEMBL28209780 0.84 HSD17B3 (0.62) HSD17B3ESR1ESR2CHRM1SLC6A2
SCHEMBL27944125 0.84 HSD17B3 (0.62) HSD17B3ESR1ESR2CHRM1SLC6A2
SCHEMBL7197697 0.82 ALDH1A1 (0.41) HSD17B3ESR1ESR2ALDH1A1LMNA
SCHEMBL5749794 0.81 ESR1 (0.58) HSD17B3ESR1ESR2MAPTCHRM1
SCHEMBL10413995 0.80 MAOA (0.45) HSD17B3CYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL10415441 0.80 MAOA (0.52) ALDH1A1
SCHEMBL10415925 0.80 MAOA (0.52) MAPTALDH1A1TSHRLMNACYP3A4
SCHEMBL14330440 0.80 CYP19A1 (0.45) HSD17B3ESR1ESR2MAPTALDH1A1
SCHEMBL78217 0.79 CES2 (0.52) ESR1LMNAPTGS2SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0202458-B1 CROSS-LINKED POLYALKENYL PHENOL BASED PHOTORESIST COMPOSITIONS International Business Machines Corporation (US) 1992-03-25 EP disclosed
EP-0226009-A2 Photoresist compositions of controlled dissolution rate in alkaline developers International Business Machines Corporation (US) 1987-06-24 EP disclosed
EP-0202458-A2 Cross-linked polyalkenyl phenol based photoresist compositions International Business Machines Corporation (US) 1986-11-26 EP disclosed
US-4221700-A POLY(ALKYLATED ALKENYLPHENOL); POLYESTERS OF ALKYLTHIOALKANOIC ACIDS OR ORGANIC PHOSPHITE MARUZEN OIL CO., LTD. (JP) 1980-09-09 US disclosed