SCHEMBL9636259

SCHEMBL9636259

CCCOc1cccc(OCCC)c1C(N)=O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.53
LMNA P02545 3/20 0.53
KMT2A Q03164 2/20 0.53
MEN1 O00255 1/20 0.53
NR1I2 O75469 1/20 0.53
CHRM2 P08172 1/20 0.53
CYP3A4 P08684 1/20 0.53
ADRA2A P08913 1/20 0.53
OPRK1 P41145 1/20 0.53
HTR2B P41595 1/20 0.53
SLC6A3 Q01959 1/20 0.53
HDAC6 Q9UBN7 1/20 0.53
HTT P42858 2/20 0.49
ALDH1A1 P00352 1/20 0.49
PKM P14618 1/20 0.49
NLRP1 Q9C000 1/20 0.49
HSD17B10 Q99714 1/20 0.47
GAA P10253 1/20 0.46
MCHR1 Q99705 1/20 0.45
PTPN1 P18031 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11453393 0.90 CYP1A2 (0.49) MAPTLMNAKMT2AMEN1NR1I2
SCHEMBL16666142 0.85 GLA (0.52) MAPTLMNAKMT2AMEN1NR1I2
SCHEMBL9712657 0.83 KMT2A (0.57) LMNAKMT2AMEN1ALDH1A1PTPN1
SCHEMBL11445471 0.82 CYP1A2 (0.60) MAPTLMNAKMT2AMEN1NR1I2
SCHEMBL9712968 0.81 NPC1 (0.48) MAPTLMNAKMT2AMEN1NR1I2
SCHEMBL9713094 0.81 NPC1 (0.51) MAPTLMNAKMT2AMEN1NR1I2
SCHEMBL11537144 0.81 MAPT (0.50) MAPTLMNAKMT2AMEN1NR1I2
SCHEMBL9713311 0.80 CA9 (0.50) MAPTLMNAKMT2AMEN1HTT
SCHEMBL3352936 0.80 LMNA (0.79) MAPTLMNAKMT2AMEN1NR1I2
SCHEMBL10795237 0.80 CYP1A2 (0.49) MAPTLMNAKMT2AMEN1NR1I2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0256820-B1 THERMAL DEVELOPING LIGHT-SENSITIVE MATERIAL KONICA CORPORATION (JP) 1992-07-29 EP disclosed
US-5032499-A High density, stability KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1991-07-16 US disclosed
EP-0256820-A2 Thermal developing light-sensitive material KONICA CORPORATION (JP) 1988-02-24 EP disclosed