Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ANPEP | P15144 | 1/20 | 0.49 |
| ▸ | DPP4 | P27487 | 1/20 | 0.49 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.48 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.48 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.45 |
| ▸ | MAOA | P21397 | 2/20 | 0.41 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.40 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.40 |
| ▸ | ELANE | P08246 | 3/20 | 0.40 |
| ▸ | CTSG | P08311 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | HPGD | P15428 | 3/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | MAOB | P27338 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11017672 | 0.92 | GABRA1 (0.52) | ANPEPDPP4GABRA1GABRB2PDK2 | |
| SCHEMBL10965181 | 0.90 | ANPEP (0.54) | ANPEPDPP4GABRA1GABRB2PDK2 | |
| SCHEMBL27728745 | 0.89 | ANPEP (0.53) | ANPEPDPP4GABRA1GABRB2PDK2 | |
| SCHEMBL28615381 | 0.85 | ELANE (0.48) | ANPEPDPP4HSPA5ELANECTSG | |
| SCHEMBL29362539 | 0.84 | GABRA1 (0.50) | ANPEPDPP4GABRA1GABRB2HSPA5 | |
| SCHEMBL980892 | 0.84 | GABRA1 (0.50) | ANPEPDPP4GABRA1GABRB2HSPA5 | |
| SCHEMBL11018106 | 0.82 | ANPEP (0.54) | ANPEPDPP4GABRA1GABRB2PDK2 | |
| SCHEMBL323999 | 0.82 | GABRA1 (0.48) | ANPEPDPP4GABRA1GABRB2HSPA5 | |
| Ammonia Solution, Strong SCHEMBL324961 | 0.82 | GABRA1 (0.48) | ANPEPDPP4GABRA1GABRB2HSPA5 | |
| SCHEMBL10783896 | 0.81 | PDK2 (0.47) | ANPEPDPP4GABRA1GABRB2PDK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-05 | — | — | US | disclosed |
| US-20210109448-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-04-15 | — | — | US | disclosed |
| EP-3805191-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND RESIN PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-04-14 | — | — | EP | disclosed |
| EP-0496876-A1 | FILLED THERMOPLASTIC MOLDING COMPOSITIONS | THE DOW CHEMICAL COMPANY (US) | 1992-08-05 | — | — | EP | disclosed |
| WO-1992003507-A1 | FILLED THERMOPLASTIC MOLDING COMPOSITIONS | THE DOW CHEMICAL COMPANY (US) | 1992-03-05 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | RER1, FEM1B, UNC119 | ANPEP 3884/4885DPP4 4848/4885GABRA1 408/4885 |
| US-20210109448-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN | RER1, FEM1B, UNC119 | ANPEP 3884/4885DPP4 4848/4885GABRA1 408/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.