SCHEMBL9647489

SCHEMBL9647489

Nc1ccc(Cc2ccc(C(=O)O)c(C(=O)O)c2)cc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.65
CDC25B P30305 2/20 0.65
CASP6 P55212 1/20 0.65
RCE1 Q9Y256 1/20 0.65
KLKB1 P03952 1/20 0.56
CTSB P07858 1/20 0.56
MMP9 P14780 1/20 0.56
DNMT1 P26358 1/20 0.56
DNMT3B Q9UBC3 1/20 0.56
DNMT3L Q9UJW3 1/20 0.56
DNMT3A Q9Y6K1 1/20 0.56
HNF4A P41235 1/20 0.54
CYP3A4 P08684 3/20 0.52
TDP1 Q9NUW8 3/20 0.52
TSHR P16473 2/20 0.52
MAPT P10636 4/20 0.48
KDM4E B2RXH2 4/20 0.48
PTPN1 P18031 4/20 0.48
GAA P10253 2/20 0.48
ESR2 Q92731 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2117125 0.90 KLKB1 (0.67) ALDH1A1CDC25BCASP6RCE1KLKB1
SCHEMBL29365057 0.88 KLKB1 (0.69) ALDH1A1CDC25BCASP6RCE1KLKB1
SCHEMBL21621 0.88 KLKB1 (0.69) ALDH1A1CDC25BCASP6RCE1KLKB1
SCHEMBL4989005 0.87 ALDH1A1 (0.86) ALDH1A1CDC25BCASP6RCE1KLKB1
SCHEMBL5553313 0.86 KLKB1 (0.67) ALDH1A1CDC25BCASP6RCE1KLKB1
SCHEMBL4521510 0.85 HNF4A (0.73) ALDH1A1CDC25BCASP6RCE1KLKB1
SCHEMBL14865727 0.84 ALDH1A1 (0.59) ALDH1A1CDC25BCASP6RCE1KLKB1
Ethylene SCHEMBL28295970 0.84 KLKB1 (0.64) ALDH1A1CDC25BCASP6RCE1KLKB1
SCHEMBL6866417 0.83 KLKB1 (0.58) ALDH1A1CDC25BCASP6RCE1KLKB1
SCHEMBL107442 0.79 ALDH1A1 (1.00) ALDH1A1CDC25BCASP6RCE1KLKB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0255037-B1 A METHOD FOR FORMING POLYIMIDE FILM BY CHEMICAL VAPOR DEPOSITION HITACHI, LTD. (JP) 1992-12-09 EP claimed
US-4759958-A Method for forming polyimide film by chemical vapor deposition HITACHI, LTD. (JP) 1988-07-26 US claimed
EP-0255037-B1 A METHOD FOR FORMING POLYIMIDE FILM BY CHEMICAL VAPOR DEPOSITION HITACHI, LTD. (JP) 1992-12-09 EP disclosed
US-4759958-A Method for forming polyimide film by chemical vapor deposition HITACHI, LTD. (JP) 1988-07-26 US disclosed