SCHEMBL9655586

SCHEMBL9655586

CCN(CC)c1ccc(-n2nc3ccccc3n2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.53
KDM4E B2RXH2 2/20 0.53
HTT P42858 2/20 0.51
RAB9A P51151 3/20 0.50
MEN1 O00255 3/20 0.50
KMT2A Q03164 3/20 0.50
GAA P10253 1/20 0.50
MAPT P10636 6/20 0.49
KDM1A O60341 1/20 0.45
ALDH1A1 P00352 4/20 0.44
NPC1 O15118 3/20 0.44
HSD17B10 Q99714 1/20 0.44
MAPK1 P28482 2/20 0.43
NPSR1 Q6W5P4 2/20 0.43
CNR2 P34972 1/20 0.43
ALOX5 P09917 1/20 0.43
CYP3A4 P08684 2/20 0.42
TSHR P16473 2/20 0.42
PSMD14 O00487 1/20 0.42
RECQL P46063 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10999006 0.86 TERT (0.51) HPGDKDM4ERAB9AMEN1KMT2A
SCHEMBL22653490 0.83 KDM4E (0.64) HPGDKDM4EHTTRAB9AMEN1
SCHEMBL3422262 0.82 NPC1 (0.53) HPGDKDM4EHTTRAB9AMEN1
SCHEMBL9703950 0.82 ALOX5 (0.42) HPGDKDM4EHTTRAB9AMEN1
SCHEMBL11111830 0.81 ALDH1A1 (0.46) HPGDKDM4EHTTRAB9AMEN1
SCHEMBL9655378 0.81 MEN1 (0.46) HPGDKDM4EHTTRAB9AMEN1
SCHEMBL3229472 0.81 NPC1 (0.63) HPGDKDM4ERAB9AMEN1KMT2A
SCHEMBL9704277 0.81 MAPT (0.44) HPGDKDM4EHTTRAB9AMEN1
SCHEMBL10999725 0.81 NPC1 (0.51) HPGDKDM4ERAB9AMEN1KMT2A
SCHEMBL3039048 0.79 ALOX5 (0.62) HPGDKDM4EHTTRAB9AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0291881-B1 PHOTOPOLYMERISABLE REGISTRATION MATERIALS, PHOTORESIST LAYERS, AND LITHOGRAPHIC-PRINTING PLATES MADE THEREFROM BASF Aktiengesellschaft (DE) 1992-12-23 EP disclosed
EP-0476519-A1 Photopolymerisable composition and recording material produced therefrom MORTON INTERNATIONAL, INC. (US) 1992-03-25 EP disclosed
US-4886735-A Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon BASF AKTIENGESELLSCHAFT (DE) 1989-12-12 US disclosed
EP-0291881-A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom BASF Aktiengesellschaft (DE) 1988-11-23 EP disclosed
US-4743521-A PRINTING PLATES, BENZOTRIAZOLES, OXADIAZOLES BASF AKTIENGESELLSCHAFT (DE) 1988-05-10 US disclosed
US-4724338-A Generation of narrow-band, delayed electrical pulses BASF AKTIENGESELLSCHAFT (DE) 1988-02-09 US disclosed
US-4710446-A Photosensitive recording materials BASF AKTIENGESELLSCHAFT (DE) 1987-12-01 US disclosed
US-4559285-A Electrophotographic recording materials containing a metal acetylacetonate BASF AKTIENGESELLSCHAFT (DE) 1985-12-17 US disclosed
US-4556622-A Electrophotographic recording material whose photoconductor layer contains a halogenated perylene dye sensitizer BASF AKTIENGESELLSCHAFT (DE) 1985-12-03 US disclosed
US-4556621-A Electrophotographic recording material containing a metal-1,3-diketone complex BASF AKTIENGESELLSCHAFT (DE) 1985-12-03 US disclosed
US-4533612-A 2-SUBSTITUTED BENZOTRIAZOLES BASF AKTIENGESELLSCHAFT (DE) 1985-08-06 US disclosed