Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.58 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.53 |
| ▸ | TSHR | P16473 | 2/20 | 0.53 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.32 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.32 |
| ▸ | APP | P05067 | 4/20 | 0.30 |
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CASP1 | P29466 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.30 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL81017 | 1.00 | MEN1 (0.58) | MEN1KMT2AMAPK1TSHRTHRB | |
| SCHEMBL4140630 | 1.00 | MEN1 (0.58) | MEN1KMT2AMAPK1TSHRTHRB | |
| SCHEMBL10389811 | 1.00 | MEN1 (0.58) | MEN1KMT2AMAPK1TSHRTHRB | |
| SCHEMBL20398411 | 0.97 | MEN1 (0.55) | MEN1KMT2AMAPK1TSHRTHRB | |
| Methoxymethane SCHEMBL9183221 | 0.95 | MEN1 (0.52) | MEN1KMT2AMAPK1TSHRTHRB | |
| SCHEMBL23377971 | 0.93 | MEN1 (0.56) | MEN1KMT2AMAPK1TSHRTHRB | |
| Sulfuric Acid SCHEMBL4928427 | 0.89 | MEN1 (0.46) | MEN1KMT2AMAPK1TSHRTHRB | |
| Sulfuric Acid SCHEMBL4916764 | 0.89 | MEN1 (0.46) | MEN1KMT2AMAPK1TSHRTHRB | |
| Sulfuric Acid SCHEMBL4925428 | 0.89 | MEN1 (0.46) | MEN1KMT2AMAPK1TSHRTHRB | |
| Sulfuric Acid SCHEMBL4931057 | 0.89 | MEN1 (0.46) | MEN1KMT2AMAPK1TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 189 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4730966-A1 | METAL OXIDE COMPOSITION, LIGHT-EMITTING DEVICE PRODUCED USING THE METAL OXIDE COMPOSITION, ELECTRONIC APPARATUS INCLUDING THE LIGHT-EMITTING DEVICE, AND ELECTRONIC DEVICE INCLUDING THE LIGHT-EMITTING DEVICE | Samsung Display Co., Ltd. (KR) | 2026-04-22 | — | — | EP | claimed |
| US-20260103636-A1 | METAL OXIDE COMPOSITION, LIGHT-EMITTING DEVICE PRODUCED USING THE METAL OXIDE COMPOSITION, ELECTRONIC APPARATUS INCLUDING THE LIGHT-EMITTING DEVICE, AND ELECTRONIC DEVICE INCLUDING THE LIGHT-EMITTING DEVICE | SAMSUNG DISPLAY CO LTD (KR) | 2026-04-16 | — | — | US | claimed |
| US-20260028500-A1 | SEALING FILM COMPOSITIONS FOR SEALING MICROCELLS OF ELECTROOPTIC DEVICES | E INK CORP (US) | 2026-01-29 | — | — | US | claimed |
| US-12497534-B2 | Sealing film compositions for sealing microcells of electro-optic devices | E INK CORPORATION (US) | 2025-12-16 | — | — | US | claimed |
| CN-119591780-A | Photoresist additive and photoresist composition | 合肥鼎材科技有限公司 | 2025-03-11 | — | — | CN | claimed |
| CN-119439655-A | Corrosion-resistant developing solution and preparation method and application thereof | 上海戎洲芯科技有限公司 | 2025-02-14 | — | — | CN | claimed |
| EP-4433527-A1 | SEALING FILM COMPOSITIONS FOR SEALING MICROCELLS OF ELECTRO-OPTIC DEVICES | E Ink Corporation (US) | 2024-09-25 | — | — | EP | claimed |
| CN-118159595-A | Sealing film composition for sealing micro-cells of electro-optical devices | 伊英克公司 | 2024-06-07 | — | — | CN | claimed |
| CN-113087843-B | Polymer and photoresist composition containing same | 北京鼎材科技有限公司 | 2023-10-13 | — | — | CN | claimed |
| CN-108535971-B | Stripping liquid composition for removing photoresist | 易案爱富科技有限公司 | 2023-09-12 | — | — | CN | claimed |
| CN-108535971-A | Photoresist removal remover composition | 易案爱富科技有限公司 | 2018-09-14 | — | — | CN | claimed |
| US-8404216-B2 | Dendritic chelated compounds, methods for making the same and pharmaceutical compositions containing the same | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 2013-03-26 | — | — | US | claimed |
| US-20100104512-A1 | Dendritic Chelated Compounds, Methods for Making the Same and Pharmaceutical Compositions Containing the Same | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (FR) | 2010-04-29 | — | — | US | claimed |
| EP-2104714-A1 | PROCESS FOR PRODUCING NANOPARTICLES | 3M Innovative Properties Company (US) | 2009-09-30 | — | — | EP | claimed |
| WO-2008079800-A1 | PROCESS FOR PRODUCING NANOPARTICLES | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2008-07-03 | — | — | WO | claimed |
| EP-1688266-A1 | Method and solvent mix to improve the dampening of lithographic printing plates | Fuji Photo Film B.V. (NL) | 2006-08-09 | — | — | EP | claimed |
| EP-1099567-B1 | Concentrated dampening water composition for lithographic printing | FUJI PHOTO FILM CO LTD (JP) | 2006-05-03 | — | — | EP | claimed |
| EP-1099566-A1 | Dampening water composition for lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-16 | — | — | EP | claimed |
| EP-1099567-A1 | Concentrated dampening water composition for lithographic printing | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-16 | — | — | EP | claimed |
| US-5637444-A | COMPRISING POLYVINYL ALCOHOL CONTAINING ITACONIC ACID, MALEIC ACID, MALEIC ANHYDRIDE OR ESTER THEREOF AS COPOLYMER COMPONENT AND HAVING SPECIFIED SAPONIFICATION DEGREE, SELECTED HYDROXY COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1997-06-10 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260103636-A1 | METAL OXIDE COMPOSITION, LIGHT-EMITTING DEVICE PRODUCED USING THE METAL OXIDE COMPOSITION, ELECTRONIC APPARATUS INCLUDING THE LIGHT-EMITTING DEVICE, AND ELECTRONIC DEVICE INCLUDING THE LIGHT-EMITTING DEVICE | SOD1, SCO2, COPG2 | MEN1 2369/4885KMT2A 885/4885MAPK1 1670/4885 |
| US-20260028500-A1 | SEALING FILM COMPOSITIONS FOR SEALING MICROCELLS OF ELECTROOPTIC DEVICES | GJA1, GJB2, EPCAM | MEN1 929/4885KMT2A 4517/4885MAPK1 1314/4885 |
| US-20100104512-A1 | Dendritic Chelated Compounds, Methods for Making the Same and Pharmaceutical Compositions Containing the Same | ZYX, CXCR4, ZFX | MEN1 398/4885KMT2A 3370/4885MAPK1 4645/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.