SCHEMBL9677245

SCHEMBL9677245

CCCCCCCCCCCCCCOc1cccc(-c2ccccc2)c1C(=O)O

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN11 Q06124 5/20 0.56
KDM4E B2RXH2 7/20 0.54
MEN1 O00255 1/20 0.52
NR1I2 O75469 1/20 0.52
LMNA P02545 1/20 0.52
CHRM2 P08172 1/20 0.52
CYP3A4 P08684 1/20 0.52
ADRA2A P08913 1/20 0.52
MAPT P10636 1/20 0.52
OPRK1 P41145 1/20 0.52
HTR2B P41595 1/20 0.52
SLC6A3 Q01959 1/20 0.52
KMT2A Q03164 1/20 0.52
HDAC6 Q9UBN7 1/20 0.52
PTPN1 P18031 1/20 0.52
ALDH1A1 P00352 2/20 0.50
THRA P10827 1/20 0.50
THRB P10828 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
PPARA Q07869 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9330868 1.00 PTPN11 (0.56) PTPN11KDM4EMEN1NR1I2LMNA
SCHEMBL7330160 1.00 PTPN11 (0.56) PTPN11KDM4EMEN1NR1I2LMNA
Hydrochloric Acid SCHEMBL9723762 0.99 PTPN11 (0.55) PTPN11KDM4EMEN1NR1I2LMNA
SCHEMBL9723752 0.89 KDM4E (0.52) PTPN11KDM4EMEN1NR1I2LMNA
SCHEMBL10686211 0.89 KDM4E (0.50) KDM4EMEN1LMNAKMT2AALDH1A1
SCHEMBL11340524 0.85 SMN1; SMN2 (0.52) KDM4EMEN1LMNAKMT2AALDH1A1
SCHEMBL25177334 0.84 ALDH1A1 (0.55) KDM4EMAPTALDH1A1SMN1; SMN2PKM
SCHEMBL31212992 0.84 ALDH1A1 (0.55) KDM4EMAPTALDH1A1SMN1; SMN2PKM
Terephthalic Acid SCHEMBL10581511 0.83 RXRA (0.62) PTPN11KDM4EALDH1A1THRATHRB
SCHEMBL10581517 0.82 PTPN11 (0.65) PTPN11KDM4EMEN1NR1I2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5091557-A AMINO ACID DERIVATIVE HAVING LIQUID CRYSTAL PROPERTY AND PROCESS FOR PRODUCTION OF THE SAME SHOWA DENKO K.K. (JP) 1992-02-25 US disclosed
US-5041602-A Cinnamic acid used as inexpensive starting material SHOWA DENKO K.K. (JP) 1991-08-20 US disclosed