SCHEMBL9682143

SCHEMBL9682143

Cc1cc(S(=O)(=O)c2cc(C)c(Br)cc2C)c(C)cc1Br

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 1/20 0.47
NPC1 O15118 1/20 0.46
NR2F2 P24468 1/20 0.46
NOD2 Q9HC29 1/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
POLB P06746 1/20 0.46
TSHR P16473 5/20 0.46
LMNA P02545 1/20 0.46
KMT2A Q03164 1/20 0.39
HSD17B10 Q99714 1/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
BCHE P06276 1/20 0.38
CES1 P23141 1/20 0.38
RAB9A P51151 1/20 0.37
CYP1A2 P05177 1/20 0.33
CYP2C19 P33261 1/20 0.33
KDM4E B2RXH2 1/20 0.32
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL288931 0.84 NPC1 (0.45) NPC1NR2F2NOD2L3MBTL1POLB
SCHEMBL25257871 0.84 L3MBTL1 (0.45) RAPGEF4NPC1NR2F2NOD2L3MBTL1
SCHEMBL14902121 0.82 NPC1 (0.44) RAPGEF4NPC1NR2F2NOD2L3MBTL1
SCHEMBL120851 0.76 ALDH1A1 (0.42) NPC1NR2F2NOD2L3MBTL1POLB
SCHEMBL20182618 0.74 POLB (0.53) RAPGEF4NPC1NR2F2NOD2L3MBTL1
SCHEMBL9348045 0.74 L3MBTL1 (0.53) RAPGEF4NPC1NR2F2NOD2L3MBTL1
SCHEMBL17203385 0.73 L3MBTL1 (0.51) RAPGEF4NPC1NR2F2NOD2L3MBTL1
SCHEMBL2846267 0.73 TSHR (0.43) NPC1NR2F2NOD2L3MBTL1POLB
SCHEMBL2845089 0.73 POLB (0.43) NPC1NR2F2NOD2L3MBTL1POLB
SCHEMBL69647 0.71 ALDH1A1 (0.48) RAPGEF4KMT2AHSD17B10SMN1; SMN2CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5093467-A Increased molecular weight TOSOH CORPORATION (JP) 1992-03-03 US disclosed
EP-0348189-A2 Production of poly (arylene sulfide sulfone) Tosoh Corporation (JP) 1989-12-27 EP disclosed