Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.50 |
| ▸ | HTT | P42858 | 2/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.41 |
| ▸ | HTR1D | P28221 | 2/20 | 0.39 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.37 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 3/20 | 0.36 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | ESR1 | P03372 | 2/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | HTR1B | P28222 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9683683 | 0.89 | POLB (0.61) | POLBHTTCYP2C19HTR1DGABRA1 | |
| SCHEMBL6518281 | 0.86 | HTT (0.47) | POLBHTTGABRA1GABRB2MAPT | |
| SCHEMBL13791752 | 0.86 | POLB (0.42) | POLBHTTCYP2C19HTR1DGABRA1 | |
| SCHEMBL9683783 | 0.82 | POLB (0.39) | POLBHTTCYP2C19ATM | |
| SCHEMBL9447365 | 0.80 | HTT (0.42) | POLBHTTGABRA1GABRB2MAPT | |
| SCHEMBL10774635 | 0.80 | POLB (0.51) | POLBHTTCYP2C19MAPTGAA | |
| SCHEMBL9617141 | 0.79 | HTT (0.45) | POLBHTTMAPTESR1ESR2 | |
| SCHEMBL31497055 | 0.79 | POLB (0.43) | POLBCYP2C19HTR1DGABRA1GABRB2 | |
| SCHEMBL8916205 | 0.79 | POLB (0.48) | POLBHTTHTR1DMAPTESR1 | |
| SCHEMBL199385 | 0.78 | CYP2C19 (0.42) | POLBCYP2C19HTR1DGABRA1GABRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108250341-B | Catalyst system containing metallocene compound and method for catalyzing olefin polymerization by using catalyst system | 北京引发科技有限公司 | 2020-12-11 | — | — | CN | disclosed |
| US-10042258-B2 | Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-08-07 | — | — | US | disclosed |
| US-10042258-B2 | Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-08-07 | — | — | US | disclosed |
| US-9977331-B2 | Resist overlayer film forming composition and method for producing semiconductor device including the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-05-22 | — | — | US | disclosed |
| US-9977331-B2 | Resist overlayer film forming composition and method for producing semiconductor device including the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-05-22 | — | — | US | disclosed |
| US-9746768-B2 | Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| US-9746768-B2 | Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| US-20170205711-A1 | COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE USING THE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-07-20 | — | — | US | disclosed |
| US-20170205711-A1 | COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE USING THE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-07-20 | — | — | US | disclosed |
| US-20170010535-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE INCLUDING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-01-12 | — | — | US | disclosed |
| US-20150362835-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-12-17 | — | — | US | disclosed |
| US-20150248057-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-09-03 | — | — | US | disclosed |
| US-20150248057-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-09-03 | — | — | US | disclosed |
| US-9046768-B2 | Resist overlayer film forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-9046768-B2 | Resist overlayer film forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140255847-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-09-11 | — | — | US | disclosed |
| US-20140255847-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-09-11 | — | — | US | disclosed |
| EP-0492473-A1 | Process for the preparation of 4-substituted 2,6-dialkylanilines | LONZA AG (CH) | 1992-07-01 | — | — | EP | disclosed |
| US-4194008-A | INSECTICIDE, FUNGICIDE, MITICIDE, PARASITICIDES | BAYER AKTIENGESELLSCHAFT (DE) | 1980-03-18 | — | — | US | disclosed |
| EP-0000365-A1 | N-aryl-N'-alcoyl-S-alcoyl isothioureas, process for their preparation and their use against animal and vegetal pests | BAYER AG (DE) | 1979-01-24 | — | — | EP | disclosed |