SCHEMBL9704438

SCHEMBL9704438

CCCCC(O)(C(=O)C(O)(CCCC)c1ccccc1)c1ccccc1

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.51
SCN5A Q14524 3/20 0.50
SCN9A Q15858 3/20 0.50
KIF11 P52732 1/20 0.48
SIGMAR1 Q99720 1/20 0.45
CES2 O00748 3/20 0.44
CES1 P23141 3/20 0.44
L3MBTL1 Q9Y468 2/20 0.44
LMNA P02545 1/20 0.44
HTT P42858 1/20 0.44
ALOX12 P18054 1/20 0.44
CYP2C19 P33261 1/20 0.44
KMT2A Q03164 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
CHRM2 P08172 3/20 0.42
CHRM4 P08173 3/20 0.42
CHRM5 P08912 3/20 0.42
CHRM1 P11229 3/20 0.42
CHRM3 P20309 3/20 0.42
NAAA Q02083 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11831207 0.94 SCN5A (0.56) GAASCN5ASCN9AKIF11SIGMAR1
SCHEMBL11835995 0.94 SCN5A (0.56) GAASCN5ASCN9AKIF11SIGMAR1
SCHEMBL2517312 0.89 KIF11 (0.48) GAASCN5ASCN9AKIF11SIGMAR1
SCHEMBL1275973 0.87 SCN5A (0.52) GAASCN5ASCN9AKIF11SIGMAR1
SCHEMBL8669195 0.85 SCN5A (0.55) GAASCN5ASCN9AKIF11SIGMAR1
SCHEMBL5155798 0.85 SCN5A (0.55) GAASCN5ASCN9AKIF11SIGMAR1
SCHEMBL8667621 0.85 SCN5A (0.55) GAASCN5ASCN9AKIF11SIGMAR1
SCHEMBL6264368 0.85 SCN5A (0.62) GAASCN5ASCN9AKIF11SIGMAR1
SCHEMBL10357746 0.85 SCN5A (0.55) GAASCN5ASCN9AKIF11SIGMAR1
SCHEMBL7916110 0.85 SCN5A (0.55) GAASCN5ASCN9AKIF11SIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11681227-B2 Enhanced EUV photoresist materials, formulations and processes IRRESISTIBLE MATERIALS LTD (GB) 2023-06-20 US disclosed
US-20200272050-A1 Enhanced EUV Photoresist Materials, Formulations and Processes IRRESISTIBLE MATERIALS, LTD (GB) 2020-08-27 US disclosed
US-10095112-B2 Multiple trigger photoresist compositions and methods IRRESISTIBLE MATERIALS LTD (GB) 2018-10-09 US disclosed
US-20180246408-A1 MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHODS IRRESISTIBLE MATERIALS, LTD (GB) 2018-08-30 US disclosed
US-9519215-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS, LTD (GB) 2016-12-13 US disclosed
US-20160246173-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2016-08-25 US disclosed
US-9383646-B2 Two-step photoresist compositions and methods IRRESISTIBLE MATERIALS LTD (GB) 2016-07-05 US disclosed
US-9229322-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS LTD (GB) 2016-01-05 US disclosed
EP-2920142-A1 METHANOFULLERENES Robinson, Alex Philip, Graham (GB) 2015-09-23 EP disclosed
US-20150241773-A1 Two-Step Photoresist Compositions and Methods IRRESISTIBLE MATERIALS LTD (GB) 2015-08-27 US disclosed
US-20150140489-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2015-05-21 US disclosed
WO-2014137663-A1 METHANOFULLERENES ROBINSON ALEX PHILIP GRAHAM (GB) 2014-09-12 WO disclosed
WO-2014078097-A1 METHANOFULLERENES ROBINSON ALEX PHILIP GRAHAM (GB) 2014-05-22 WO disclosed
EP-0224911-B1 HIGH-MOLECULAR-WEIGHT SOLUBLE NOVOLAK RESIN AND PROCESS FOR PREPARATION THEREOF TORAY INDUSTRIES, INC. (JP) 1992-09-02 EP disclosed
US-5023311-A Reacting aldehyde with polyfunctional phenol, using acid catalyst in solution radiation sensitive resist TORAY INDUSTRIES, INC. (JP) 1991-06-11 US disclosed
EP-0224911-A2 High-molecular-weight soluble novolak resin and process for preparation thereof TORAY INDUSTRIES, INC. (JP) 1987-06-10 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10095112-B2 Multiple trigger photoresist compositions and methods ERCC4, ERCC2, APEX1 GAA 1241/4885SCN5A 4876/4885SCN9A 4354/4885
US-20150140489-A1 Composition of Matter and Molecular Resist Made Therefrom HNRNPM, TUFM, MSR1 GAA 3963/4885SCN5A 4808/4885SCN9A 4719/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.