SCHEMBL9723273

SCHEMBL9723273

CC(O)Oc1ccccc1C=O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.52
HPGD P15428 1/20 0.52
HTT P42858 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
SRC P12931 3/20 0.50
ADRA2A P08913 1/20 0.50
ADRA2B P18089 1/20 0.50
ADRA2C P18825 1/20 0.50
LMNA P02545 3/20 0.48
KMT2A Q03164 3/20 0.48
GAA P10253 1/20 0.48
PTGDR2 Q9Y5Y4 1/20 0.47
CYP1A2 P05177 1/20 0.47
CYP2C9 P11712 1/20 0.47
CYP2C19 P33261 1/20 0.47
NPSR1 Q6W5P4 1/20 0.46
TLR2 O60603 1/20 0.46
ERN1 O75460 1/20 0.46
TLR1 Q15399 1/20 0.46
TLR6 Q9Y2C9 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11333288 0.84 ALDH1A1 (0.55) ALDH1A1HPGDHTTSMN1; SMN2SRC
SCHEMBL177279 0.84 ALDH1A1 (0.55) ALDH1A1HPGDHTTSMN1; SMN2SRC
SCHEMBL18196579 0.84 ERN1 (0.64) ALDH1A1HPGDHTTSMN1; SMN2SRC
SCHEMBL6377765 0.82 ALDH1A1 (0.44) ALDH1A1HPGDADRA2AADRA2BADRA2C
SCHEMBL11323988 0.82 ALDH1A1 (0.53) ALDH1A1HPGDHTTSMN1; SMN2SRC
SCHEMBL28570178 0.81 ALDH1A1 (0.52) ALDH1A1HPGDHTTSMN1; SMN2SRC
SCHEMBL6706103 0.81 ALDH1A1 (0.52) ALDH1A1HPGDHTTSMN1; SMN2SRC
SCHEMBL28061827 0.81 ALDH1A1 (0.52) ALDH1A1HPGDHTTSMN1; SMN2SRC
SCHEMBL11338676 0.80 PTGDR2 (0.47) ALDH1A1HPGDHTTSMN1; SMN2SRC
SCHEMBL10746717 0.80 ALDH1A1 (0.52) ALDH1A1HPGDHTTSMN1; SMN2SRC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112731766-B Hard mask composition, hard mask layer and method of forming pattern 三星SDI株式会社 2024-12-17 CN claimed
CN-112731766-A Hardmask composition, hardmask layer and method of forming pattern 三星SDI株式会社 2021-04-30 CN claimed
US-20210109449-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2021-04-15 US claimed
CN-112731766-B Hard mask composition, hard mask layer and method of forming pattern 三星SDI株式会社 2024-12-17 CN disclosed
CN-112731766-A Hardmask composition, hardmask layer and method of forming pattern 三星SDI株式会社 2021-04-30 CN disclosed
US-20210109449-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2021-04-15 US disclosed
US-5118779-A Drug delivery POLYMEDICA INDUSTRIES, INC. (US) 1992-06-02 US disclosed
US-4053415-A UNSATURATED POLYESTER ETHER HAVING A PHOTOCROSSLINKABLE MOIETY FUJI PHOTO FILM CO., LTD. (JA) 1977-10-11 US disclosed