SCHEMBL973244

SCHEMBL973244

CCN(CC)/N=N/c1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 7/20 0.55
▸ ALDH1A1 P00352 3/20 0.48
▸ TSHR P16473 2/20 0.43
▸ TDP1 Q9NUW8 2/20 0.43
▸ MAPK1 P28482 2/20 0.43
▸ HSD17B10 Q99714 1/20 0.43
▸ RAB9A P51151 6/20 0.38
▸ NPC1 O15118 5/20 0.38
▸ MEN1 O00255 4/20 0.38
▸ KMT2A Q03164 4/20 0.38
▸ PKM P14618 1/20 0.38
▸ HTT P42858 1/20 0.38
▸ NPSR1 Q6W5P4 1/20 0.37
▸ CASP3 P42574 2/20 0.36
▸ SENP8 Q96LD8 2/20 0.36
▸ SENP7 Q9BQF6 2/20 0.36
▸ SENP6 Q9GZR1 2/20 0.36
▸ CYP1A1 P04798 1/20 0.35
▸ CYP1B1 Q16678 1/20 0.35
▸ SMN1; SMN2 Q16637 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL973245 1.00 MAPT (0.55) MAPTALDH1A1TSHRTDP1MAPK1
SCHEMBL3500948 1.00 MAPT (0.55) MAPTALDH1A1TSHRTDP1MAPK1
Water SCHEMBL5373028 0.98 MAPT (0.53) MAPTALDH1A1TSHRTDP1MAPK1
SCHEMBL9107945 0.83 ALDH1A1 (0.44) MAPTALDH1A1TSHRTDP1MAPK1
SCHEMBL22390704 0.83 ALDH1A1 (0.44) MAPTALDH1A1TSHRTDP1MAPK1
SCHEMBL22390702 0.83 ALDH1A1 (0.44) MAPTALDH1A1TSHRTDP1MAPK1
SCHEMBL4416832 0.80 ALDH1A1 (0.47) MAPTALDH1A1TSHRTDP1MAPK1
SCHEMBL14366560 0.80 MAPT (0.58) MAPTALDH1A1TDP1MAPK1RAB9A
SCHEMBL2107416 0.78 MAPT (0.56) MAPTALDH1A1TDP1RAB9ANPC1
SCHEMBL6517951 0.78 MAPT (0.56) MAPTALDH1A1TSHRTDP1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106398783-B A kind of No. 100 unleaded aviation gasoline and preparation method thereof 华东理工大学 2018-04-20 — — CN claimed
EP-3529340-B1 MARINE DIESEL LUBRICANT OIL COMPOSITIONS CHEVRON ORONITE TECH BV (NL) 2023-10-25 — — EP disclosed
US-11608455-B2 Adhesive for semiconductor device, and high productivity method for manufacturing said device SHOWA DENKO MATERIALS CO., LTD. (JP) 2023-03-21 — — US disclosed
US-11230684-B2 Marine diesel lubricant oil compositions CHEVRON ORONITE TECHNOLOGY B.V. (NL) 2022-01-25 — — US disclosed
CN-108352333-B Adhesive for semiconductor, semiconductor device, and method for manufacturing semiconductor device 昭和电工材料株式会社 2021-07-20 — — CN disclosed
US-10669454-B2 Method for manufacturing semiconductor device including heating and pressuring a laminate having an adhesive layer HITACHI CHEMICAL COMPANY, LTD. (JP) 2020-06-02 — — US disclosed
US-20200095481-A1 ADHESIVE FOR SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SAID DEVICE RESONAC CORPORATION (JP) 2020-03-26 — — US disclosed
EP-3529340-A1 MARINE DIESEL LUBRICANT OIL COMPOSITIONS Chevron Oronite Technology B.V. (NL) 2019-08-28 — — EP disclosed
US-20190256794-A1 MARINE DIESEL LUBRICANT OIL COMPOSITIONS CHEVRON ORONITE TECHNOLOGY B.V. (NL) 2019-08-22 — — US disclosed
US-20180312731-A1 ADHESIVE FOR SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SAID DEVICE RESONAC CORPORATION (JP) 2018-11-01 — — US disclosed
WO-1997003041-A1 PROCESS FOR REDUCING ORGANIC POLLUTANTS THE TRUSTEES OF PRINCETON UNIVERSITY (US) 1997-01-30 — — WO disclosed
US-5380622-A Phenol-formaldehyde-naphthoquinone diazide BASF AKTIENGESELLSCHAFT (DE) 1995-01-10 — — US disclosed
EP-0453950-A2 Process for the production of negative relief images BASF Aktiengesellschaft (DE) 1991-10-30 — — EP disclosed
US-5017462-A Process of producing negative relief copies utilizing photosensitive copying material with thermal hardening triazine compound HOECHST AKTIENGESELLSCHAFT (DE) 1991-05-21 — — US disclosed
EP-0352637-A2 Ferroelectric liquid crystal composition, liquid crystal optical device produced by using the ferroelectric liquid crystal composition, and method of producing the liquid crystal optical device IDEMITSU KOSAN COMPANY LIMITED (JP) 1990-01-31 — — EP disclosed
EP-0302359-A2 Positive photo-sensitive compositions HOECHST AKTIENGESELLSCHAFT (DE) 1989-02-08 — — EP disclosed
EP-0285014-A2 Light-sensitive composition, registration material prepared therewith and process for the production of printing forms HOECHST AKTIENGESELLSCHAFT (DE) 1988-10-05 — — EP disclosed
EP-0164083-A2 Positively acting light-sensitive coating solution HOECHST AKTIENGESELLSCHAFT (DE) 1985-12-11 — — EP disclosed
EP-0068808-A2 Photoresist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-01-05 — — EP disclosed
US-4189320-A CARRIER FO PHENOL-FORMALDEHYDE NOVOLAK REACTED WITH AN ORGANIC ISOCYANATE AMERICAN HOECHST CORPORATION (US) 1980-02-19 — — US disclosed
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