Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | XPO1 | O14980 | 3/20 | 0.37 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.35 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26129905 | 0.79 | TSHR (0.40) | TSHRXPO1ADRA1APDE4DLMNA | |
| SCHEMBL640114 | 0.79 | TSHR (0.40) | TSHRXPO1ADRA1APDE4DLMNA | |
| SCHEMBL666917 | 0.79 | TSHR (0.40) | TSHRXPO1ADRA1APDE4DLMNA | |
| SCHEMBL9747340 | 0.78 | TSHR (0.36) | TSHRXPO1ADRA1APDE4DLMNA | |
| SCHEMBL9745606 | 0.77 | TSHR (0.39) | TSHRXPO1ADRA1APDE4DLMNA | |
| SCHEMBL9244632 | 0.77 | TSHR (0.39) | TSHRXPO1ADRA1APDE4DLMNA | |
| SCHEMBL9746345 | 0.77 | TSHR (0.39) | TSHRXPO1ADRA1APDE4DLMNA | |
| SCHEMBL2065900 | 0.77 | TSHR (0.39) | TSHRXPO1ADRA1APDE4DLMNA | |
| SCHEMBL1520934 | 0.77 | TSHR (0.39) | TSHRXPO1ADRA1APDE4DLMNA | |
| SCHEMBL3476792 | 0.76 | LMNA (0.44) | TSHRXPO1ADRA1APDE4DLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103154042-B | Photoetching technique multipolymer and manufacture method thereof, anti-corrosion agent composition, forms the manufacture method of the substrate of pattern, the evaluation method of multipolymer, multipolymer composition analytic method | MITSUBISHI RAYON CO.,LTD. (JP) | 2015-12-16 | — | — | CN | disclosed |
| CN-103154042-A | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI RAYON CO | 2013-06-12 | — | — | CN | disclosed |
| CN-102753476-A | Carbon nanotube sheet and process for production thereof | UNIV HOKKAIDO NAT UNIV CORP | 2012-10-24 | — | — | CN | disclosed |
| CN-102712561-A | Bicyclohexane derivative compound and process for producing the same | MITSUBISHI GAS CHEMICAL CO | 2012-10-03 | — | — | CN | disclosed |
| CN-101823989-B | Polymer for resist, resist composition, pattern forming method and material compound for resist polymer | MITSUBISHI RAYON CO | 2012-05-09 | — | — | CN | disclosed |
| CN-102341366-A | Adamantane derivative, method for producing same, polymer using same as starting material, and resin composition | MITSUBISHI GAS CHEMICAL CO | 2012-02-01 | — | — | CN | disclosed |
| CN-1930194-B | Resist polymer, resist composition, method for producing pattern, and raw material compound for resist polymer | MITSUBISHI RAYON CO | 2011-03-30 | — | — | CN | disclosed |
| CN-101823989-A | Resist with polymkeric substance, resist composition and method of manufacturing pattern and resist with the polymkeric substance starting compound | MITSUBISHI RAYON CO | 2010-09-08 | — | — | CN | disclosed |
| CN-1976962-B | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | MITSUBISHI RAYON CO | 2010-06-23 | — | — | CN | disclosed |
| CN-1976962-A | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | MITSUBISHI RAYON CO (JP) | 2007-06-06 | — | — | CN | disclosed |
| CN-1930194-A | Resist polymer, resist composition, method for producing pattern, and raw material compound for resist polymer | MITSUBISHI RAYON CO (JP) | 2007-03-14 | — | — | CN | disclosed |
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | disclosed |