⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21082738 | 0.97 | CA12 (0.60) | — | |
| SCHEMBL16384580 | 0.97 | — | — | |
| SCHEMBL978782 | 0.91 | — | — | |
| SCHEMBL125862 | 0.84 | — | — | |
| SCHEMBL1720385 | 0.84 | CYP1A2 (0.39) | — | |
| SCHEMBL322518 | 0.81 | CA12 (0.93) | — | |
| SCHEMBL323273 | 0.81 | CA12 (0.93) | — | |
| SCHEMBL2012007 | 0.81 | CA12 (0.93) | — | |
| SCHEMBL15605765 | 0.81 | MAOA (0.40) | — | |
| SCHEMBL732232 | 0.81 | CA12 (0.93) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1031884-B1 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-01-11 | — | — | EP | claimed |
| US-7968507-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | claimed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | claimed |
| CN-101398639-A | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO LTD (KR) | 2009-04-01 | — | — | CN | claimed |
| US-6638694-B2 | Mixtures of amines, water soluble solvents and corrosion resistance agents, used for removing photoresist films and residues after etching semiconductor integrated circuits or liquid crystal displays | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2003-10-28 | — | — | US | claimed |
| US-20030186175-A1 | RESIST STRIPPING AGENT AND PROCESS OF PRODUCING SEMICONDUCTOR DEVICES USING THE SAME | IKEMOTO KAZUTO (JP) | 2003-10-02 | — | — | US | claimed |
| EP-1031884-A2 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-08-30 | — | — | EP | claimed |
| CN-105676601-B | Pretreatment method of glass substrate for forming etching mask | 东京应化工业株式会社 | 2020-08-07 | — | — | CN | disclosed |
| CN-110950781-A | Novel diamine, polyamic acid, and polyimide | 日产化学工业株式会社 | 2020-04-03 | — | — | CN | disclosed |
| US-10023530-B2 | Diamine, polyamic acid, and polyimide | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20160264520-A1 | NOVEL DIAMINE, POLYAMIC ACID, AND POLYIMIDE | NISSAN CHEMICAL INDUSTRIES. LTD. (JP) | 2016-09-15 | — | — | US | disclosed |
| US-20150296646-A1 | PROTECTIVE PLATE AND DISPLAY DEVICE | SHARP KABUSHIKI KAISHA (JP) | 2015-10-15 | — | — | US | disclosed |
| US-8790990-B2 | Silica-based film forming material for formation of air gaps, and method for forming air gaps | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-1031884-A2 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-08-30 | — | — | EP | disclosed |
| US-4072741-A | BACTERICIDES, FUNGICIDES | IMC CHEMICAL GROUP, INC. (US) | 1978-02-07 | — | — | US | disclosed |