Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.54 |
| ▸ | CA2 | P00918 | 6/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 5/20 | 0.52 |
| ▸ | TSHR | P16473 | 4/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | ATM | Q13315 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3097258 | 0.92 | CA2 (0.47) | ALDH1A1TDP1CA2CYP3A4TSHR | |
| SCHEMBL3100324 | 0.90 | ALDH1A1 (0.50) | ALDH1A1TDP1CA2CYP3A4TSHR | |
| SCHEMBL23498284 | 0.90 | ALDH1A1 (0.50) | ALDH1A1TDP1CA2CYP3A4TSHR | |
| SCHEMBL3104066 | 0.90 | ALDH1A1 (0.50) | ALDH1A1TDP1CA2CYP3A4TSHR | |
| SCHEMBL3093790 | 0.90 | LMNA (0.50) | ALDH1A1TDP1CA2CYP3A4TSHR | |
| SCHEMBL980921 | 0.90 | ALDH1A1 (0.54) | ALDH1A1TDP1CA2CYP3A4TSHR | |
| SCHEMBL979077 | 0.90 | CA2 (0.43) | ALDH1A1TDP1CA2CYP3A4TSHR | |
| SCHEMBL1442563 | 0.86 | — | — | |
| SCHEMBL3884493 | 0.86 | ALDH1A1 (0.68) | ALDH1A1TDP1CA2CYP3A4TSHR | |
| SCHEMBL11607418 | 0.85 | LMNA (0.50) | ALDH1A1TDP1CA2CYP3A4TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5047312-A | Absorption in near infrared, laser light | BASF AKTIENGESELLSCHAFT (DE) | 1991-09-10 | — | — | US | claimed |
| CN-115279831-B | Composition, cured product, and method for producing cured product | 株式会社艾迪科 | 2024-05-31 | — | — | CN | disclosed |
| CN-114222773-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2024-04-09 | — | — | CN | disclosed |
| WO-2023223888-A1 | METHOD FOR PRODUCING POLYCARBONATE RESIN, AND ALICYCLIC POLYCARBONATE RESIN | 旭化成株式会社 | 2023-11-23 | — | — | WO | disclosed |
| WO-2023176680-A1 | COMPOSITION AND CURED PRODUCT | 株式会社ADEKA | 2023-09-21 | — | — | WO | disclosed |
| CN-116249920-A | Method for producing colored layer, agent, and laminate | 株式会社艾迪科 | 2023-06-09 | — | — | CN | disclosed |
| CN-115279831-A | Composition, cured product, and method for producing cured product | 株式会社艾迪科 | 2022-11-01 | — | — | CN | disclosed |
| CN-107132734-B | Electrophotographic photoreceptor, process cartridge, and image forming apparatus | 富士胶片商业创新有限公司 | 2022-06-10 | — | — | CN | disclosed |
| CN-114222773-A | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2022-03-22 | — | — | CN | disclosed |
| CN-109721723-B | Surfactant, method for producing the same, and solution containing the same | 中日合成化学股份有限公司 | 2021-07-06 | — | — | CN | disclosed |
| CN-109721723-A | Interfacial agent, its manufacturing method and the solution comprising this interfacial agent | 中日合成化学股份有限公司 | 2019-05-07 | — | — | CN | disclosed |
| EP-3473627-A1 | HETEROCYCLIC COMPOUND AND ORGANIC ELECTRONIC DEVICE COMPRISING SAME | LG Chem, Ltd. (KR) | 2019-04-24 | — | — | EP | disclosed |
| US-20110001221-A1 | DIELECTRIC LAYER | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2011-01-06 | — | — | US | disclosed |
| US-7829137-B2 | Fabricating dielectric layer | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2010-11-09 | — | — | US | disclosed |
| CN-100505169-C | Dielectric layer and composition and method for forming the same | IND TECH RES INST (CN) | 2009-06-24 | — | — | CN | disclosed |
| CN-101009223-A | Dielectric layer and composition and method for forming the same | IND TECH RES INST (CN) | 2007-08-01 | — | — | CN | disclosed |
| US-20070172583-A1 | DIELECTRIC LAYER, COMPOSITION AND METHOD FOR FORMING THE SAME | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2007-07-26 | — | — | US | disclosed |
| EP-0358080-B1 | Silicon naphthalocyanine with unsaturated ligands, and optical recording medium | BASF AG (DE) | 1993-12-01 | — | — | EP | disclosed |
| US-5047312-A | Absorption in near infrared, laser light | BASF AKTIENGESELLSCHAFT (DE) | 1991-09-10 | — | — | US | disclosed |
| EP-0358080-A2 | Silicon naphthalocyanine with unsaturated ligands, and optical recording medium | BASF Aktiengesellschaft (DE) | 1990-03-14 | — | — | EP | disclosed |