Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 4/20 | 0.46 |
| ▸ | ESR1 | P03372 | 5/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | CA7 | P43166 | 1/20 | 0.43 |
| ▸ | CA9 | Q16790 | 1/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.43 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 3/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.42 |
| ▸ | RNASEL | Q05823 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10359066 | 1.00 | ELANE (0.46) | ELANEESR1CA12CA1CA2 | |
| SCHEMBL9488299 | 0.95 | ESR2 (0.44) | ELANEESR1CA12CA1CA2 | |
| SCHEMBL12017408 | 0.89 | ESR1 (0.47) | ELANEESR1ESR2TSHRSMN1; SMN2 | |
| SCHEMBL10000787 | 0.87 | ELANE (0.47) | ELANEESR1TSHRCYP1A2CYP2C19 | |
| SCHEMBL25968326 | 0.87 | ELANE (0.61) | ELANEESR1CA2LMNATSHR | |
| SCHEMBL20138640 | 0.86 | ESR1 (0.44) | ELANEESR1CA12CA1CA2 | |
| SCHEMBL26499157 | 0.85 | ELANE (0.46) | ELANEESR1CA1CA2LMNA | |
| SCHEMBL12419169 | 0.85 | LMNA (0.52) | ELANEESR1LMNAHIF1AALDH1A1 | |
| SCHEMBL10053083 | 0.85 | ESR1 (0.47) | ESR1ESR2LMNAHSD17B10MEN1 | |
| SCHEMBL19222173 | 0.84 | ELANE (0.44) | ELANEESR1CA12CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 266 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231225-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-07-11 | — | — | US | disclosed |
| CN-113646052-B | Reversible thermochromic composition, reversible thermochromic microcapsule pigment, and writing instrument | 百乐墨水株式会社 | 2024-05-17 | — | — | CN | disclosed |
| WO-2023213696-A1 | DEVELOPMENT OF NOVEL NEUTRAL MATS CONTAINING HYDROXYL MONOMERS TO IMPROVE SIARC SUBSTRATE COMPATIBILITY FOR DIRECTED SELF-ASSEMBLY OF DIBLOCK COPOLYMERS | MERCK PATENT GMBH (DE) | 2023-11-09 | — | — | WO | disclosed |
| US-20230350290-A1 | PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2023-11-02 | — | — | US | disclosed |
| EP-4270108-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-11-01 | — | — | EP | disclosed |
| US-11773059-B2 | Onium salt, chemically amplified negative resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-11747727-B2 | Chemical liquid, chemical liquid storage body, pattern forming method, and kit | FUJIFILM CORPORATION (JP) | 2023-09-05 | — | — | US | disclosed |
| CN-110446770-B | Reversible thermochromic composition and reversible thermochromic microcapsule pigment containing the same | 百乐墨水株式会社 | 2023-08-08 | — | — | CN | disclosed |
| EP-0355772-B1 | Liquid-crystalline copolymer | IDEMITSU KOSAN CO (JP) | 1993-12-29 | — | — | EP | disclosed |
| US-5248446-A | Copolyethers from epoxy compounds, ferroelectricity | IDEMITSU KOSAN CO., LTD. (JP) | 1993-09-28 | — | — | US | disclosed |
| EP-0325035-B1 | LIQUID CRYSTAL COMPOUND AND METHOD OF MANUFACTURING THE SAME, LIQUID CRYSTAL COMPOSITION CONTAINING THE SAME AND LIQUID CRYSTAL DISPLAY DEVICE | KABUSHIKI KAISHA TOSHIBA (JP) | 1993-08-18 | — | — | EP | disclosed |
| US-5190686-A | LIQUID-CRYSTALLINE COPOLYMER | IDEMITSU KOSAN CO., LTD. (JP) | 1993-03-02 | — | — | US | disclosed |
| EP-0258898-B1 | LIQUID-CRYSTALLINE POLYMER | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-04-22 | — | — | EP | disclosed |
| US-4976887-A | Optically active liquid crystal compound and method of manufacturing the same, liquid crystal composition containing the same and liquid crystal display device | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-12-11 | — | — | US | disclosed |
| EP-0355772-A2 | Liquid-crystalline copolymer | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1990-02-28 | — | — | EP | disclosed |
| EP-0325035-A2 | Liquid crystal compound and method of manufacturing the same, liquid crystal composition containing the same and liquid crystal display device | KABUSHIKI KAISHA TOSHIBA (JP) | 1989-07-26 | — | — | EP | disclosed |
| US-4818807-A | Liquid-crystalline polymer | IDEMITSU KOSAN CO., LTD. (JP) | 1989-04-04 | — | — | US | disclosed |
| EP-0258898-A2 | Liquid-crystalline polymer | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1988-03-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11773059-B2 | Onium salt, chemically amplified negative resist composition, and pattern forming process | LBR, IDUA, ADORA1 | ELANE 2086/4885ESR1 1589/4885CA12 1061/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.