SCHEMBL9488299

SCHEMBL9488299

CCC(C)C(=O)Oc1ccc(-c2ccc(O)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 2/20 0.44
MAPT P10636 1/20 0.42
ELANE P08246 3/20 0.42
ESR1 P03372 4/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
CA14 Q9ULX7 1/20 0.40
LMNA P02545 2/20 0.39
TSHR P16473 2/20 0.39
PREP P48147 1/20 0.39
HIF1A Q16665 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39
MAPK1 P28482 1/20 0.39
CYP2C19 P33261 1/20 0.39
NR1H2 P55055 1/20 0.39
RNASEL Q05823 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL97654 0.95 ELANE (0.46) ESR2MAPTELANEESR1CA12
SCHEMBL10359066 0.95 ELANE (0.46) ESR2MAPTELANEESR1CA12
SCHEMBL10000787 0.93 ELANE (0.47) MAPTELANEESR1TSHRHIF1A
SCHEMBL10422503 0.87 HSD17B10 (0.53) MAPTELANELMNASMN1; SMN2ALDH1A1
SCHEMBL825538 0.87 MAPT (0.56) MAPTELANECYP1A2CYP2C19SMN1; SMN2
SCHEMBL15965768 0.87 LMNA (0.47) MAPTELANEESR1LMNAHIF1A
SCHEMBL14781032 0.85 MAPT (0.48) MAPTELANELMNACYP1A2CYP2C19
SCHEMBL10422526 0.85 ESR1 (0.57) MAPTELANEESR1LMNAHIF1A
SCHEMBL12017408 0.84 ESR1 (0.47) ESR2ELANEESR1TSHRSMN1; SMN2
SCHEMBL20614960 0.84 MAPT (0.54) MAPTELANEESR1HIF1ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150293446-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-15 US disclosed
EP-0228703-B1 FERROELECTRIC LIQUID CRYSTAL POLYMER IDEMITSU KOSAN COMPANY LIMITED (JP) 1993-03-10 EP disclosed
US-4913839-A USABLE AT ROOM TEMPERATURE; FAST RESPONSE SPEED; DISPLAYING MOTION PICTURES; SUITABLE FOR LARGE OR CURVED SCREENS IDEMITSU KOSAN CO., LTD. (JP) 1990-04-03 US disclosed
US-4844835-A FAST RESPONSE, DISPLAYING MOTION PICTURES IDENITSU KOSAN CO., LTD. (JP) 1989-07-04 US disclosed
EP-0228703-A2 Ferroelectric liquid crystal polymer IDEMITSU KOSAN COMPANY LIMITED (JP) 1987-07-15 EP disclosed