Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1898772 | 0.90 | — | — | |
| SCHEMBL967515 | 0.88 | — | — | |
| SCHEMBL12121036 | 0.83 | TSHR (0.32) | — | |
| SCHEMBL10941907 | 0.81 | — | — | |
| SCHEMBL16821946 | 0.81 | — | — | |
| SCHEMBL5170309 | 0.77 | CA1 (0.40) | CA1CA9 | |
| SCHEMBL447330 | 0.77 | CA1 (0.40) | CA1CA9 | |
| SCHEMBL5171201 | 0.77 | CA1 (0.40) | CA1CA9 | |
| SCHEMBL14480209 | 0.77 | — | — | |
| SCHEMBL29221041 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1154321-B1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL CO (JP) | 2010-08-25 | — | — | EP | claimed |
| US-6548221-B2 | Comprising 2-alkyl-2-adamantyl (meth)acrylate monomer; for production of semiconductors via lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-15 | — | — | US | claimed |
| US-20020081523-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL CO., LTD. | 2002-06-27 | — | — | US | claimed |
| US-6383713-B1 | ADAMANTYL ACRYLATE POLYMERS AND ACID GENERATORS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-07 | — | — | US | claimed |
| CN-113614073-B | Polymer, resist composition, method for producing patterned substrate, and method for producing (meth) acrylate | 三菱化学株式会社 | 2024-09-24 | — | — | CN | disclosed |
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| CN-111978275-B | Purification method of 3-acrylate-4-butyrolactone | 宁波南大光电材料有限公司（CN） | 2023-01-13 | — | — | CN | disclosed |
| CN-113614073-A | Polymer, resist composition, method for producing substrate having pattern formed thereon, and (meth) acrylate and method for producing same | 三菱化学株式会社 | 2021-11-05 | — | — | CN | disclosed |
| US-20210341839-A1 | FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-04 | — | — | US | disclosed |
| US-20210333712-A1 | IODIZED AROMATIC CARBOXYLIC ACID TYPE PENDANT-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-10-28 | — | — | US | disclosed |
| WO-2021117836-A1 | PHOTOCURABLE MATERIAL COMPOSITION, AND CURED PRODUCT OF PHOTOCURABLE MATERIAL COMPOSITION AND METHOD FOR MANUFACTURING SAME | キヤノン株式会社 | 2021-06-17 | — | — | WO | disclosed |
| CN-111978275-A | Purification method of 3-acrylate-4-butyrolactone | 宁波南大光电材料有限公司 | 2020-11-24 | — | — | CN | disclosed |
| US-6537726-B2 | Polymeric unit derived from 3-hydroxy-1-adamantyl(meth)acrylate and polymeric unit derived from beta-(meth)acryloyloxy-gamma-butyrolactone; adhesion, sensitivity, resolution | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-03-25 | — | — | US | disclosed |
| US-20020081523-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL CO., LTD. | 2002-06-27 | — | — | US | disclosed |
| US-6406830-B2 | BIS(SULFONIUM METHYL)KETONE BISPERFLUOROALKANESULFONATE ACID GENERATOR WITH TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALTS, AND A RESIN HAVING A UNIT UNSTABLE TO AN ACID, SUCH AS 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE; RESOLUTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-06-18 | — | — | US | disclosed |
| US-20020006582-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | disclosed |
| US-6313321-B1 | Process for preparing β-hydroxy-γ-butyrolactones and β-(meth)acryloyloxy-γ-butrolactones | MITSUBISHI RAYON CO., LTD. (JP) | 2001-11-06 | — | — | US | disclosed |
| US-20010016298-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-23 | — | — | US | disclosed |
| EP-1052258-A1 | PROCESS FOR PRODUCING BETA-HYDROXY-GAMMA-BUTYROLACTONE DERIVATIVES AND BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONE DERIVATIVES | Mitsubishi Rayon Co., Ltd. (JP) | 2000-11-15 | — | — | EP | disclosed |
| JP-2000275843-A | CHEMICALLY AMPLIFIABLE POSITIVE RESIST COMPOSITION | SUMITOMO CHEM CO LTD | 2000-10-06 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210341839-A1 | FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | NAF1, PFN1, COL1A1 | CA1 39/4885CA9 96/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.