Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.52 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 4/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.43 |
| ▸ | APOBEC3G | Q9HC16 | 2/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | BACE1 | P56817 | 3/20 | 0.38 |
| ▸ | MAOA | P21397 | 1/20 | 0.36 |
| ▸ | MAOB | P27338 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30832932 | 1.00 | MEN1 (0.52) | MEN1KMT2APOLBMAPTNPSR1 | |
| SCHEMBL5835220 | 0.83 | MEN1 (0.54) | MEN1KMT2APOLBMAPTNPSR1 | |
| SCHEMBL11096023 | 0.81 | MEN1 (0.52) | MEN1KMT2APOLBMAPTNPSR1 | |
| SCHEMBL11097583 | 0.79 | MEN1 (0.50) | MEN1KMT2APOLBMAPTNPSR1 | |
| SCHEMBL11097562 | 0.77 | KMT2A (0.48) | MEN1KMT2APOLBMAPTNPSR1 | |
| SCHEMBL29180223 | 0.76 | CPA3 (0.49) | MEN1KMT2APOLBMAPTNPSR1 | |
| SCHEMBL11592728 | 0.75 | HSD17B10 (0.48) | MEN1KMT2APOLBMAPTNPSR1 | |
| SCHEMBL14565233 | 0.75 | MAOA (0.48) | MAPTCA1CA2CA4CA7 | |
| SCHEMBL11101018 | 0.74 | POLB (0.48) | MEN1KMT2APOLBMAPTNPSR1 | |
| SCHEMBL29280293 | 0.73 | MEN1 (0.45) | MEN1KMT2APOLBMAPTNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8192923-B2 | Photoresist stripping solution and a method of stripping photoresists using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-05 | — | — | US | claimed |
| EP-1775339-B1 | Aqueous cleaning composition and method for using same | AIR PROD & CHEM (US) | 2011-11-16 | — | — | EP | claimed |
| US-20110264943-A1 | STORAGE CONTROL DEVICE | HITACHI, LTD. (JP) | 2011-10-27 | — | — | US | claimed |
| US-20080011714-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU | 2008-01-17 | — | — | US | claimed |
| US-20070105035-A1 | Photoresist stripping solution and method of treating substrate with the same | YOKOI SHIGERU | 2007-05-10 | — | — | US | claimed |
| US-20070037087-A1 | salt of hydrofluoric acid with a non-metal base, a water-soluble organic solvent, a mercapto group containing corrosion inhibitor, and water; protects aluminum and copper wiring from corrosion while stripping photoresist films and post-ashing residues; nonprecipitating corrosion inhibitor | YOKOI SHIGERU | 2007-02-15 | — | — | US | claimed |
| US-20060063688-A1 | Photoresist stripping solution and method of treating substrate with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-03-23 | — | — | US | claimed |
| US-20050084792-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | YOKOI SHIGERU (JP) | 2005-04-21 | — | — | US | claimed |
| US-20030114014-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-06-19 | — | — | US | claimed |
| US-20250270480-A1 | PROCESSING SOLUTION, METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-08-28 | — | — | US | disclosed |
| US-20250270474-A1 | PROCESSING SOLUTION, METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-08-28 | — | — | US | disclosed |
| US-20250197783-A1 | PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-19 | — | — | US | disclosed |
| US-20240425780-A1 | CLEANING SOLUTION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-12-26 | — | — | US | disclosed |
| US-20240117280-A1 | METAL RESIDUE REMOVING LIQUID, METAL RESIDUE REMOVING METHOD, AND METAL WIRING MANUFACTURING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20040259761-A1 | Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION | 2004-12-23 | — | — | US | disclosed |
| US-20040121937-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-06-24 | — | — | US | disclosed |
| CN-1495535-A | Etching solution for forming bimetallic mosaic structure craft and base phate treatment method | ͬ�Ϳ�ҵ��ʽ���� | 2004-05-12 | — | — | CN | disclosed |
| US-20030138737-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-07-24 | — | — | US | disclosed |
| CN-1428659-A | Stripping liquid for photoresist and photoresist stripping method using said stripping liguid | TOKYO APPLIED CHEMICAL INDUSTR (JP) | 2003-07-09 | — | — | CN | disclosed |
| US-20030114014-A1 | Photoresist stripping solution and a method of stripping photoresists using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-06-19 | — | — | US | disclosed |