SCHEMBL9768633

SCHEMBL9768633

NCC(N)CC(c1ccccc1)c1ccccc1

nearest known ligand 0.61

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 4/20 0.61
HTR2A P28223 3/20 0.61
HRH1 P35367 2/20 0.50
CHRNB2 P17787 1/20 0.50
CHRNA4 P43681 1/20 0.50
DPP4 P27487 2/20 0.46
F2 P00734 1/20 0.46
GRM2 Q14416 1/20 0.46
GRM3 Q14832 1/20 0.46
SLC6A2 P23975 1/20 0.42
SLC6A4 P31645 1/20 0.42
SLC6A3 Q01959 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17504547 0.80 TAAR1 (0.65) TAAR1HTR2A
SCHEMBL4793449 0.79 HRH1 (0.60) TAAR1HTR2AHRH1CHRNB2CHRNA4
SCHEMBL10622687 0.77 HTR2A (0.55) TAAR1HTR2AHRH1CHRNB2CHRNA4
SCHEMBL149259 0.76 HTR2A (1.00) TAAR1HTR2AHRH1CHRNB2CHRNA4
SCHEMBL9838705 0.76 HTR2A (0.58) TAAR1HTR2AHRH1CHRNB2CHRNA4
SCHEMBL11710648 0.74 TAAR1 (0.58) TAAR1HTR2AHRH1CHRNB2CHRNA4
Bromide SCHEMBL6737914 0.74 HTR2A (0.94) TAAR1HTR2AHRH1CHRNB2CHRNA4
Hydrochloric Acid SCHEMBL8550503 0.74 HTR2A (0.94) TAAR1HTR2AHRH1CHRNB2CHRNA4
Water SCHEMBL28365853 0.74 HTR2A (0.94) TAAR1HTR2AHRH1CHRNB2CHRNA4
SCHEMBL7678158 0.73 TAAR1 (0.50) TAAR1HTR2AHRH1DPP4F2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4069418-A1 PROCESS FOR PREPARING AMINES OVER A COPPER CATALYST BASF SE (DE) 2022-10-12 EP disclosed
WO-2021110472-A1 PROCESS FOR PREPARING AMINES OVER A COPPER CATALYST BASF SE (DE) 2021-06-10 WO disclosed
CN-107532055-B Cold-curing epoxy primer or adhesive SIKA技术股份公司 2021-02-19 CN disclosed
CN-110382587-A The method for being used to prepare the curing agent of low emission composition epoxy resin SIKA技术股份公司 2019-10-25 CN disclosed
EP-3350244-B1 HARDENER FOR LOW-EMISSION EPOXY RESIN COMPOSITIONS SIKA TECH AG (CH) 2019-08-28 EP disclosed
CN-106715515-B Amines for low emission epoxy resin compositions SIKA技术股份公司 2019-08-16 CN disclosed
US-10301423-B2 Amine for low-emission epoxy resin compositions SIKA TECHNOLOGY AG (CH) 2019-05-28 US disclosed
EP-3180383-B1 AMINE FOR LOW-EMISSION EPOXY RESIN COMPOSITIONS SIKA TECH AG (CH) 2018-10-10 EP disclosed
EP-3350244-A1 CURING AGENT FOR LOW-EMISSION EPOXY RESIN COMPOSITIONS Sika Technology AG (CH) 2018-07-25 EP disclosed
CN-108124448-A For the amine of low emission composition epoxy resin SIKA技术股份公司 2018-06-05 CN disclosed
CN-107922585-A Low Emission Epoxy Resin Composition SIKA技术股份公司 2018-04-17 CN disclosed
US-20170218114-A1 AMINE FOR LOW-EMISSION EPOXY RESIN COMPOSITIONS SIKA TECHNOLOGY AG (CH) 2017-08-03 US disclosed
EP-3180383-A1 AMINE FOR LOW-EMISSION EPOXY RESIN COMPOSITIONS Sika Technology AG (CH) 2017-06-21 EP disclosed
CN-106715515-A Amines for low emission epoxy resin compositions SIKA技术股份公司 2017-05-24 CN disclosed
WO-2017046293-A1 CURING AGENT FOR LOW-EMISSION EPOXY RESIN COMPOSITIONS SIKA TECHNOLOGY AG (CH) 2017-03-23 WO disclosed
EP-3144334-A1 HARDENER FOR LOW-EMISSION EPOXY RESIN COMPOSITIONS Sika Technology AG (CH) 2017-03-22 EP disclosed
WO-2016023839-A1 AMINE FOR LOW-EMISSION EPOXY RESIN COMPOSITIONS SIKA TECHNOLOGY AG (CH) 2016-02-18 WO disclosed
US-5021187-A In aqueous solutions iwth peroxy compounds; antisoilants; hydrophobic stains LEVER BROTHERS COMPANY, DIVISION OF CONOPCO, INC. (US) 1991-06-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170218114-A1 AMINE FOR LOW-EMISSION EPOXY RESIN COMPOSITIONS EEF1A1, EEF1A2, EEF1E1 TAAR1 242/4885HTR2A 766/4885HRH1 191/4885
US-10301423-B2 Amine for low-emission epoxy resin compositions EEF1A1, EEF1A2, PNMT TAAR1 218/4885HTR2A 598/4885HRH1 186/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.