SCHEMBL653574

SCHEMBL653574

C=C(C)c1ccc(OC(=O)OC(C)(C)C)cc1

nearest known ligand 0.72

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ELANE P08246 12/20 0.72
KDM1A O60341 1/20 0.46
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
LMNA P02545 1/20 0.40
MAPT P10636 2/20 0.40
CA2 P00918 1/20 0.39
HSD17B10 Q99714 1/20 0.39
HPGD P15428 1/20 0.37
RAB9A P51151 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25695941 0.86 ELANE (0.55) ELANEKDM1AMAPTCA2
SCHEMBL8998586 0.86 ELANE (0.77) ELANEKDM1AMEN1KMT2ALMNA
SCHEMBL4060714 0.86 ELANE (0.77) ELANEKDM1AMEN1KMT2ALMNA
SCHEMBL9775755 0.85 ELANE (0.53) ELANEKDM1AMEN1KMT2ALMNA
SCHEMBL9740987 0.85 KMT2A (0.53) ELANEMEN1KMT2ALMNAMAPT
SCHEMBL4061370 0.85 ELANE (0.81) ELANEKDM1AMEN1KMT2ALMNA
SCHEMBL10483714 0.84 ELANE (1.00) ELANEKDM1A
SCHEMBL4928927 0.83 ELANE (0.68) ELANEKDM1AMEN1KMT2AMAPT
SCHEMBL9707101 0.83 ELANE (0.62) ELANEKDM1AMEN1KMT2ALMNA
SCHEMBL4059722 0.82 ELANE (0.77) ELANEKDM1AKMT2AMAPTCA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6455416-B1 Developer soluble dyed BARC for dual damascene process ADVANCED MICRO DEVICES, INC. 2002-09-24 US claimed
US-5770345-A Photoresist having increased sensitivity and use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-06-23 US claimed
US-5753412-A Photoresist having increased sensitivity and use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-05-19 US claimed
US-5593812-A Photoresist having increased sensitivity and use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1997-01-14 US claimed
US-5272042-A Positive photoresist system for near-UV to visible imaging INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1993-12-21 US claimed
EP-0516426-A1 Resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1992-12-02 EP claimed
EP-0484021-A1 Resist composition NIPPON PAINT CO., LTD. (JP) 1992-05-06 EP claimed
EP-0102450-B1 RESIST COMPOSITIONS International Business Machines Corporation (US) 1991-09-04 EP claimed
US-4491628-A TERT-BUTYL ESTERS OR CARBONATES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1985-01-01 US claimed
EP-0102450-A2 Resist compositions International Business Machines Corporation (US) 1984-03-14 EP claimed
CN-119002178-A Positive resist composition and method for forming resist pattern 湖北鼎龙芯盛科技有限公司 2024-11-22 CN disclosed
CN-115279744-A Modified thioxanthone photoinitiators 林特弗德有限公司 2022-11-01 CN disclosed
US-20210277017-A1 Thioxanthone Derivatives, Composition Comprising the Same and Pattern Forming Method Comprising Said Composition LINTFIELD LIMITED (GB) 2021-09-09 US disclosed
CN-112969965-A Thioxanthone derivative, composition comprising the same, and pattern forming method comprising the composition 林特弗德有限公司 2021-06-15 CN disclosed
EP-3824349-A1 THIOXANTHONE DERIVATIVES, COMPOSITION COMPRISING THE SAME AND PATTERN FORMING METHOD COMPRISING SAID COMPOSITION Lintfield Limited (GB) 2021-05-26 EP disclosed
US-4877719-A CONTAINING A COMPOUND CAPABLE OF PRODUCING AN ACID UPON RADIATION WITH ACTINIC RADIATION FUJI PHOTO FILM CO., LTD. (JP) 1989-10-31 US disclosed
EP-0330386-A2 Radiation sensitive materials and devices made therewith AT&T Corp. (US) 1989-08-30 EP disclosed
US-4689289-A BISSILYL PINACOLATE-CONTAINING SILICONE-ACRYLATE OR -SUBSTITUTED STYRENE COPOLYMER, ARYL ONIUM SALT, PHOTORESISTS GENERAL ELECTRIC COMPANY (US) 1987-08-25 US disclosed
US-4491628-A TERT-BUTYL ESTERS OR CARBONATES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1985-01-01 US disclosed
EP-0102450-A2 Resist compositions International Business Machines Corporation (US) 1984-03-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210277017-A1 Thioxanthone Derivatives, Composition Comprising the Same and Pattern Forming Method Comprising Said Composition TPMT, TST, PPOX ELANE 1447/4885KDM1A 1216/4885MEN1 4096/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.