SCHEMBL9779494

SCHEMBL9779494

Nc1ccc(-c2ccc(N)c(NC=O)c2)cc1NC=O

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HDAC2 Q92769 14/20 0.43
HDAC1 Q13547 6/20 0.43
HDAC3 O15379 5/20 0.43
TDP1 Q9NUW8 3/20 0.42
KMT2A Q03164 3/20 0.42
MEN1 O00255 2/20 0.42
CYP3A4 P08684 3/20 0.38
ALDH1A1 P00352 2/20 0.38
TSHR P16473 2/20 0.38
ALOX15 P16050 1/20 0.38
HSD17B10 Q99714 1/20 0.38
KDM4E B2RXH2 1/20 0.38
GFER P55789 1/20 0.38
RXFP1 Q9HBX9 1/20 0.38
MAPK1 P28482 1/20 0.37
POLB P06746 1/20 0.36
MAPT P10636 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10707842 0.92 HDAC1 (0.43) HDAC2HDAC1HDAC3TDP1KMT2A
SCHEMBL16640691 0.85 IKBKB (0.57) HDAC2HDAC1HDAC3KMT2AKDM4E
SCHEMBL24405304 0.83 ALDH1A1 (0.36) HDAC2HDAC1TDP1KMT2AMEN1
SCHEMBL29032711 0.81 HDAC2 (0.60) HDAC2TDP1KMT2AMEN1ALDH1A1
SCHEMBL22519394 0.79 KDM5A (0.33) HDAC2HDAC1ALDH1A1TSHR
SCHEMBL28256378 0.79 SOS1 (0.46)
SCHEMBL10945153 0.78 NR4A1 (0.48) HDAC2HDAC1HDAC3TDP1KMT2A
SCHEMBL14355319 0.77 ALOX15 (0.59) HDAC2HDAC1HDAC3TDP1KMT2A
SCHEMBL20093805 0.75 BRD4 (0.51)
SCHEMBL14668939 0.75 TDP1 (0.52) TDP1KMT2AMEN1CYP3A4ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0119162-B1 PHOTOPOLYMERISABLE COMPOSITION, MATERIAL COATED THEREWITH, AND PROCESS FOR OBTAINING RELIEF IMAGES CIBA-GEIGY AG (CH) 1988-03-23 EP claimed
US-5011755-A Relief Images CIBA-GEIGY CORPORATION (US) 1991-04-30 US disclosed
EP-0119162-B1 PHOTOPOLYMERISABLE COMPOSITION, MATERIAL COATED THEREWITH, AND PROCESS FOR OBTAINING RELIEF IMAGES CIBA-GEIGY AG (CH) 1988-03-23 EP disclosed
US-4548891-A PHOTORESISTS; HEAT RESISTANCE; THICKNESS; SHARPNESS CIBA GEIGY CORPORATION (US) 1985-10-22 US disclosed
EP-0119162-A2 Photopolymerisable composition, material coated therewith, and process for obtaining relief images CIBA-GEIGY AG (CH) 1984-09-19 EP disclosed