SCHEMBL978595

SCHEMBL978595

O=Cc1cccc(-c2cccc(-c3ccccc3)c2)c1C=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGER1 P34995 3/20 0.41
PTGER3 P43115 3/20 0.41
PTGER2 P43116 3/20 0.41
PTGER4 P35408 2/20 0.41
MEN1 O00255 4/20 0.41
KMT2A Q03164 4/20 0.41
LMNA P02545 2/20 0.41
THRB P10828 2/20 0.41
BLM P54132 2/20 0.41
TDP1 Q9NUW8 1/20 0.41
RAB9A P51151 3/20 0.40
KMO O15229 1/20 0.39
PTPN1 P18031 3/20 0.39
PTPN2 P17706 2/20 0.39
NPC1 O15118 2/20 0.39
MAPT P10636 2/20 0.38
APAF1 O14727 1/20 0.38
XBP1 P17861 1/20 0.38
PTBP1 P26599 1/20 0.38
HTT P42858 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29808505 0.89 KMT2A (0.44) MEN1KMT2ALMNATHRBBLM
SCHEMBL17422069 0.89 KMT2A (0.44) MEN1KMT2ALMNATHRBBLM
SCHEMBL29390160 0.89 KMT2A (0.48) MEN1KMT2ALMNATHRBBLM
SCHEMBL549020 0.89 KMT2A (0.48) MEN1KMT2ALMNATHRBBLM
SCHEMBL19154057 0.87 MEN1 (0.46) PTGER1PTGER3PTGER2PTGER4MEN1
SCHEMBL10594740 0.85 RAB9A (0.43) PTGER1PTGER3PTGER2MEN1KMT2A
SCHEMBL17422064 0.81 KMT2A (0.44) MEN1KMT2ALMNATHRBBLM
SCHEMBL29639996 0.81 KMT2A (0.44) MEN1KMT2ALMNATHRBBLM
SCHEMBL647952 0.81 ALDH1A1 (0.44) PTGER1PTGER3PTGER2PTGER4MEN1
SCHEMBL23121511 0.80 MEN1 (0.43) PTGER1PTGER3PTGER2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3166921-A1 PROCESS FOR PRODUCING AROMATIC PRIMARY DIAMINES Rhodia Operations (FR) 2017-05-17 EP disclosed
EP-1739485-B1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2016-08-31 EP disclosed
WO-2016004867-A1 PROCESS FOR PRODUCING AROMATIC PRIMARY DIAMINES RHODIA OPERATIONS (FR) 2016-01-14 WO disclosed
US-7871751-B2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-01-18 US disclosed
US-20080153031-A1 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-06-26 US disclosed
CN-101088046-A Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2007-12-12 CN disclosed
EP-1739485-A1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-01-03 EP disclosed