Fluoride

Fluoride

SCHEMBL9788488

F.[CaH2].[Si]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL9788487 1.00
Fluoride SCHEMBL21528063 0.87
Methane SCHEMBL28107777 0.87
Fluoride SCHEMBL28056825 0.87
SCHEMBL140676 0.82
Fluoride SCHEMBL971782 0.82
Fluoride SCHEMBL2024982 0.82
Fluoride SCHEMBL2185288 0.82
Fluoride SCHEMBL6318587 0.82
Fluoride SCHEMBL4861337 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024025243-A1 ORAL COMPOSITION (주)메디클러스 2024-02-01 WO claimed
CN-111945902-A Waterproof layer node structure of kitchen and bathroom and construction method thereof 北京中房国建地下防水工程顾问有限公司 2020-11-17 CN claimed
US-3983012-A Epitaxial growth of silicon or germanium by electrodeposition from molten salts THE BOARD OF TRUSTEES OF LELAND STANFORD JUNIOR UNIVERSITY (US) 1976-09-28 US claimed
WO-2024025243-A1 ORAL COMPOSITION (주)메디클러스 2024-02-01 WO disclosed
WO-2023282356-A1 ORAL COMPOSITION AND PROPHYLACTIC OR TREATMENT METHOD FOR DISEASES OF THE ORAL CAVITY 住友化学株式会社 2023-01-12 WO disclosed
CN-111945902-A Waterproof layer node structure of kitchen and bathroom and construction method thereof 北京中房国建地下防水工程顾问有限公司 2020-11-17 CN disclosed
US-4993442-A Methods for removing obstructions from conduits using sulfuric acid adducts UNION OIL COMPANY OF CALIFORNIA (US) 1991-02-19 US disclosed
US-4142947-A ELECTRODEPOSITION OF POLYCRYSTALLINE SILICON FROM A MOLTEN FLUORIDE BATH AND PRODUCT COHEN URI 1979-03-06 US disclosed
US-3983012-A Epitaxial growth of silicon or germanium by electrodeposition from molten salts THE BOARD OF TRUSTEES OF LELAND STANFORD JUNIOR UNIVERSITY (US) 1976-09-28 US disclosed