Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | ESR1 | P03372 | 1/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | SRC | P12931 | 2/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CRHBP | P24387 | 1/20 | 0.33 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27218967 | 0.88 | POLB (0.46) | POLBESR1ESR2KMT2AMAPK1 | |
| SCHEMBL9800763 | 0.85 | POLB (0.39) | POLBNPSR1L3MBTL1GAAESR1 | |
| SCHEMBL5091135 | 0.84 | HPGD (0.41) | POLBNPSR1L3MBTL1GAAESR1 | |
| SCHEMBL11223311 | 0.83 | CYP2D6 (0.42) | POLBNPSR1L3MBTL1GAAKMT2A | |
| SCHEMBL10896082 | 0.80 | CRHBP (0.37) | POLBNPSR1L3MBTL1GAAKMT2A | |
| SCHEMBL3420270 | 0.80 | ALDH1A1 (0.40) | POLBNPSR1L3MBTL1GAAESR1 | |
| SCHEMBL4730584 | 0.80 | ESR1 (0.40) | POLBNPSR1L3MBTL1GAAESR1 | |
| SCHEMBL27801809 | 0.79 | POLB (0.41) | POLBNPSR1L3MBTL1GAAKMT2A | |
| SCHEMBL28485975 | 0.79 | CES1 (0.42) | POLBNPSR1L3MBTL1ESR1ESR2 | |
| SCHEMBL5932732 | 0.78 | POLB (0.40) | POLBNPSR1L3MBTL1GAAKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-63234006-A | — | — | None | — | — | JP | disclosed |
| US-20240160102-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2024-05-16 | — | — | US | disclosed |
| EP-0230656-B1 | HALOGEN-CONTAINING POLYACRYLATE DERIVATIVES | Tosoh Corporation (JP) | 1991-03-13 | — | — | EP | disclosed |
| US-4822721-A | FORMING PHOTORESIST PATTERNS | TOYO SODA MANUFACTURING CO., LTD. (JP) | 1989-04-18 | — | — | US | disclosed |
| JP-S63234006-A | HALOGEN-CONTAINING POLYACRYLIC ESTER DERIVATIVE | TOSOH CORP | 1988-09-29 | — | — | JP | disclosed |
| US-4752635-A | PHOTORESISTS; PHOTOSENSITIVITY; DRY ETCHING RESISTANCE | TOYO SODA MANUFACTURING CO., LTD. (JP) | 1988-06-21 | — | — | US | disclosed |
| EP-0230656-A1 | Halogen-containing polyacrylate derivatives | Tosoh Corporation (JP) | 1987-08-05 | — | — | EP | disclosed |