SCHEMBL9804229

SCHEMBL9804229

COC(OC)[SiH2]c1cccc(N)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.44
CYP3A4 P08684 3/20 0.44
CASP1 P29466 2/20 0.41
RECQL P46063 1/20 0.41
TP53 P04637 1/20 0.36
KDM4E B2RXH2 2/20 0.35
LMNA P02545 1/20 0.35
ENPP2 Q13822 1/20 0.35
F2 P00734 1/20 0.35
PRSS1 P07477 1/20 0.35
PRSS2 P07478 1/20 0.35
PRSS3 P35030 1/20 0.35
CA2 P00918 3/20 0.34
CA12 O43570 2/20 0.34
CA1 P00915 2/20 0.34
CA9 Q16790 2/20 0.34
CA14 Q9ULX7 2/20 0.34
TDP1 Q9NUW8 2/20 0.34
CA7 P43166 1/20 0.34
MAOB P27338 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30038673 1.00 ALDH1A1 (0.44) ALDH1A1CYP3A4CASP1RECQLTP53
SCHEMBL8995713 0.78 TSHR (0.41) ALDH1A1CYP3A4CASP1RECQLTP53
SCHEMBL10610942 0.75 TDP1 (0.41) ALDH1A1CYP3A4TP53TDP1TSHR
SCHEMBL210198 0.74 CA4 (0.36) ALDH1A1CYP3A4TP53KDM4ELMNA
SCHEMBL9401853 0.74 ALDH1A1 (0.48) ALDH1A1CYP3A4CASP1RECQLTP53
SCHEMBL23493419 0.73 TP53 (0.44) ALDH1A1CYP3A4TP53TDP1TSHR
SCHEMBL23493437 0.72 ALDH1A1 (0.33) ALDH1A1CYP3A4TSHRMEN1KMT2A
SCHEMBL397347 0.71 CA1 (0.33) ENPP2CA2CA1
SCHEMBL1172590 0.71 CYP3A4 (0.42) ALDH1A1CYP3A4CASP1RECQLTP53
SCHEMBL19528658 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0216007-B1 PROCESS FOR PRODUCING ORGANIC SILICON-TERMINATED POLYIMIDE PRECURSOR AND POLYIMIDE HITACHI, LTD. (JP) 1991-03-13 EP claimed
US-4748228-A Process for producing organic silicon-terminated polyimide precursor and polyimide HITACHI. LTD. (JP) 1988-05-31 US claimed
EP-0216007-A2 Process for producing organic silicon-terminated polyimide precursor and polyimide HITACHI, LTD. (JP) 1987-04-01 EP claimed
US-20230167252-A1 RESIN FILM, METHOD FOR PRODUCING SAME, RESIN COMPOSITION, DISPLAY AND METHOD FOR PRODUCING SAME TORAY INDUSTRIES, INC. (JP) 2023-06-01 US disclosed
CN-115315462-A Resin film, method for producing same, resin composition, display, and method for producing same 东丽株式会社 2022-11-08 CN disclosed
EP-0216007-B1 PROCESS FOR PRODUCING ORGANIC SILICON-TERMINATED POLYIMIDE PRECURSOR AND POLYIMIDE HITACHI, LTD. (JP) 1991-03-13 EP disclosed
US-4748228-A Process for producing organic silicon-terminated polyimide precursor and polyimide HITACHI. LTD. (JP) 1988-05-31 US disclosed
US-4686147-A SILICONE CONTAINING POLYIMIDES INSULATION LAYER HITACHI, LTD. (JP) 1987-08-11 US disclosed
EP-0216007-A2 Process for producing organic silicon-terminated polyimide precursor and polyimide HITACHI, LTD. (JP) 1987-04-01 EP disclosed