SCHEMBL98044

SCHEMBL98044

Cc1cc(C)c(C(=O)Pc2ccccc2)c(C)c1

nearest known ligand 0.39

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.38
CRHR1 P34998 2/20 0.37
KMT2A Q03164 3/20 0.37
MEN1 O00255 2/20 0.37
METAP2 P50579 1/20 0.36
FFAR4 Q5NUL3 1/20 0.36
HPGD P15428 2/20 0.36
KDM4E B2RXH2 2/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
MCOLN3 Q8TDD5 1/20 0.36
NFE2L2 Q16236 1/20 0.35
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL30768081 0.98 LMNA (0.37) LMNACRHR1KMT2AMEN1METAP2
Water SCHEMBL27753202 0.98 LMNA (0.37) LMNACRHR1KMT2AMEN1METAP2
SCHEMBL30957831 0.98 CRHR1 (0.39) LMNACRHR1KMT2AMEN1METAP2
SCHEMBL12002961 0.98 LMNA (0.37) LMNACRHR1KMT2AMEN1METAP2
SCHEMBL7177452 0.98 LMNA (0.37) LMNACRHR1KMT2AMEN1METAP2
Lithium SCHEMBL30019571 0.98 LMNA (0.37) LMNACRHR1KMT2AMEN1METAP2
Acetic Acid SCHEMBL30431333 0.96 LMNA (0.36) LMNACRHR1KMT2AMEN1METAP2
Formic Acid SCHEMBL27984500 0.93 NFE2L2 (0.35) LMNACRHR1KMT2AMEN1METAP2
Phosphoric Acid SCHEMBL29002444 0.93 LMNA (0.37) LMNACRHR1KMT2AMEN1METAP2
Ether SCHEMBL27129881 0.89 CRHR1 (0.38) LMNACRHR1KMT2AMEN1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 421 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119119906-A High-stability UV (ultraviolet) adhesive-reducing tape and preparation method thereof 安徽明讯新材料科技股份有限公司 2024-12-13 CN claimed
CN-118384318-A Preparation method of multifunctional double-layer heterogeneous hydrogel dressing 大连理工大学 2024-07-26 CN claimed
CN-118324991-A Easily-removed low-ash photosensitive resin and preparation method and application thereof 中南大学 2024-07-12 CN claimed
EP-4370564-A1 COMPOSITION BASED ON (METH)ACRYLATE MONOMERS Bostik SA (FR) 2024-05-22 EP claimed
EP-4341306-A1 COMPOSITION BASED ON (METH)ACRYLATE MONOMERS Bostik SA (FR) 2024-03-27 EP claimed
WO-2024041271-A1 4D PRINTING TECHNOLOGY-BASED MULTI-RESPONSE VARIABLE-STRUCTURE WHEEL, AND VEHICLE 江苏大学 2024-02-29 WO claimed
CN-116830036-A Two-component system 西托斯股份公司 2023-09-29 CN claimed
CN-116769404-A Ultraviolet light curing adhesive and preparation method thereof 浙江至格科技有限公司 2023-09-19 CN claimed
CN-116285789-A OCA optical cement for large-screen nano silver film and preparation method thereof 苏州赛伍应用技术股份有限公司 2023-06-23 CN claimed
CN-116157459-A Method for preparing free radical cured silicone release coating 赢创运营有限公司 2023-05-23 CN claimed
CN-106634458-A UV (ultraviolet) black primer for forward and reverse roller coating 惠州市长润发涂料有限公司 2017-05-10 CN claimed
CN-106470673-A Polymer formulations for nasolacrimal stimulation 奥库利维公司 2017-03-01 CN claimed
CN-104379624-B Radiation Curable Compounds 巴斯夫欧洲公司 2016-10-19 CN claimed
EP-2826824-B1 Radiation curable inkjet inks and industrial inkjet printing methods AGFA GRAPHICS NV (BE) 2016-08-17 EP claimed
CN-105131036-A Preparation process of photo-initiator bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide ZHANGJIAGANG JIMUTE CHEMICAL TECHNOLOGY CO LTD 2015-12-09 CN claimed
EP-2445722-B1 PRINTING METHOD SERICOL LTD (GB) 2015-10-28 EP claimed
CN-102471633-B D1479 Stable liquid bisacylphosphine photoinitiators and their use in radiation curable compositions DSM IP ASSETS BV 2015-03-18 CN claimed
CN-104379624-A Radiation Curable Compounds BASF SE 2015-02-25 CN claimed
CN-104327116-A D1479 STABLE LIQUID BAP PHOTOINITIATOR AND ITS USE IN RADIATION CURABLE COMPOSITIONS DSM IP ASSETS BV 2015-02-04 CN claimed
EP-1036829-B1 Ultraviolet curable coating compositions for cationic electrodeposition applicable to metallic materials and electrically conductive plastic materials SHIMIZU KK (JP) 2007-06-13 EP claimed