SCHEMBL980781

SCHEMBL980781

CCCC(CCC[O])C(C)C

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
METAP1 P53582 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10662128 0.84 OPRM1 (0.39) METAP1
SCHEMBL30987410 0.81 OPRM1 (0.38)
SCHEMBL4444621 0.81 DNM1 (0.39)
SCHEMBL599955 0.81 TSHR (0.40) METAP1
SCHEMBL11496797 0.79 OPRM1 (0.48)
SCHEMBL4800234 0.77 OPRM1 (0.46)
SCHEMBL3104095 0.76 LMNA (0.32) METAP1
SCHEMBL4395094 0.76
SCHEMBL4656057 0.75 DNM1 (0.43)
SCHEMBL6011939 0.75 LMNA (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110001221-A1 DIELECTRIC LAYER INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2011-01-06 US disclosed
US-7829137-B2 Fabricating dielectric layer INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2010-11-09 US disclosed
US-20070172583-A1 DIELECTRIC LAYER, COMPOSITION AND METHOD FOR FORMING THE SAME INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2007-07-26 US disclosed