SCHEMBL9810932

SCHEMBL9810932

C=Cc1ccc(S(=O)(=O)O)cc1.O=C1CC(c2ccccc2)C(=O)N1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.50
KMT2A Q03164 2/20 0.42
TSHR P16473 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.38
MEN1 O00255 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
MMP2 P08253 4/20 0.34
MMP8 P22894 4/20 0.34
MMP9 P14780 3/20 0.34
MMP12 P39900 3/20 0.34
MMP14 P50281 3/20 0.34
MMP3 P08254 3/20 0.34
MMP1 P03956 2/20 0.34
MMP13 P45452 2/20 0.34
MMP16 P51512 2/20 0.34
ADAM17 P78536 2/20 0.34
RIPK1 Q13546 1/20 0.33
PKM P14618 1/20 0.33
POLB P06746 1/20 0.33
CYP2D6 P10635 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL65808 0.79 KMT2A (0.57) KMT2ATSHRSMN1; SMN2MEN1L3MBTL1
Styrene SCHEMBL27867074 0.74 TDP1 (0.84) TDP1TSHRSMN1; SMN2POLBCYP2D6
Styrene SCHEMBL697500 0.73 TDP1 (0.81) TDP1TSHRSMN1; SMN2POLBCYP2D6
SCHEMBL9810942 0.72 TDP1 (0.64) TDP1KMT2ATSHRSMN1; SMN2MEN1
Biphenyl SCHEMBL31074210 0.71 TDP1 (0.78) TDP1TSHRSMN1; SMN2MMP2MMP14
SCHEMBL31126649 0.71 TDP1 (1.00) TDP1TSHRSMN1; SMN2L3MBTL1POLB
SCHEMBL25711 0.71 TDP1 (1.00) TDP1TSHRSMN1; SMN2L3MBTL1POLB
SCHEMBL452529 0.71 TDP1 (1.00) TDP1TSHRSMN1; SMN2L3MBTL1POLB
Styrene SCHEMBL7857368 0.69 TDP1 (0.73) TDP1TSHRSMN1; SMN2L3MBTL1MMP2
Ammonia Solution, Strong SCHEMBL814454 0.69 TDP1 (0.95) TDP1TSHRSMN1; SMN2L3MBTL1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5002853-A Polymeric Sulfonyloxy-Amides and Iides FUJI PHOTO FILM CO., LTD. (JP) 1991-03-26 US disclosed
EP-0363198-A2 Positive working photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1990-04-11 EP disclosed