SCHEMBL9824671

SCHEMBL9824671

CC(=C(Cl)Cl)c1ccccc1Cl

nearest known ligand 0.50

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.50
CES1 P23141 1/20 0.50
ALDH1A1 P00352 4/20 0.48
POLB P06746 2/20 0.45
TSHR P16473 2/20 0.41
LMNA P02545 1/20 0.41
HPGD P15428 3/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2C19 P33261 1/20 0.39
KMT2A Q03164 1/20 0.39
MAPT P10636 1/20 0.39
ERCC5 P28715 1/20 0.38
FEN1 P39748 1/20 0.38
TP53 P04637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11859876 0.82 TSHR (0.52) CES2CES1ALDH1A1TSHRCYP1A2
SCHEMBL10768438 0.80 CES2 (0.54) CES2CES1ALDH1A1POLBTSHR
SCHEMBL25680262 0.79 CES2 (0.48) CES2CES1ALDH1A1POLBTSHR
SCHEMBL9487828 0.79 CES2 (0.48) CES2CES1ALDH1A1POLBTSHR
SCHEMBL25680264 0.79 CES2 (0.48) CES2CES1ALDH1A1POLBTSHR
SCHEMBL1431970 0.77 CES2 (0.56) CES2CES1ALDH1A1POLBTSHR
SCHEMBL5408652 0.77 CES2 (0.56) CES2CES1ALDH1A1POLBTSHR
SCHEMBL10338504 0.76 CES2 (0.50) CES2CES1ALDH1A1POLBTSHR
SCHEMBL251174 0.75 CES2 (0.54) CES2CES1ALDH1A1POLBTSHR
SCHEMBL9199572 0.75 CES2 (0.54) CES2CES1ALDH1A1POLBTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0270709-B1 PROCESS FOR THE PRODUCTION OF VINYL POLYMERS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-02-06 EP disclosed
EP-0270709-A1 Process for the production of vinyl polymers SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1988-06-15 EP disclosed
US-4587203-A USING A DEVELOPMENT SOLVENT AND RINSING NONSOLVENT; SILANE COUPLING INTERLAYER; DIMENSIONAL STABILITY AND SHARPNESS OF IMAGE HUGHES AIRCRAFT COMPANY (US) 1986-05-06 US disclosed
US-4535054-A IRRADIATION TO GIVE NEGATIVE PATTERN IMAGE, DEVELOPMENT BY DISSOLUING UNEXPOSED POLYMER WITH SOLVENT AND RINSING HUGHES AIRCRAFT COMPANY (US) 1985-08-13 US disclosed
US-3932573-A Process for producing glass fiber reinforced injection molding compounds ETHYL CORPORATION (US) 1976-01-13 US disclosed