SCHEMBL9841111

SCHEMBL9841111

CC(=O)c1c(N)cccc1N

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.54
CYP3A4 P08684 4/20 0.43
TSHR P16473 2/20 0.43
PIK3CA P42336 1/20 0.43
BRD4 O60885 1/20 0.42
MMP2 P08253 1/20 0.41
HSD17B10 Q99714 4/20 0.41
KDM4E B2RXH2 2/20 0.41
MAPT P10636 2/20 0.41
LMNA P02545 1/20 0.41
PKM P14618 1/20 0.41
RXFP1 Q9HBX9 1/20 0.41
TP53 P04637 1/20 0.41
ALDH1A1 P00352 4/20 0.40
CFTR P13569 1/20 0.40
HPGD P15428 2/20 0.39
TDP1 Q9NUW8 1/20 0.39
KMT2A Q03164 2/20 0.39
CD44 P16070 1/20 0.39
ALOX15 P16050 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL7967074 0.97 THRB (0.52) THRBCYP3A4TSHRPIK3CABRD4
SCHEMBL30590428 0.86 CD44 (0.48) THRBCYP3A4TSHRPIK3CABRD4
SCHEMBL3502815 0.86 THRB (0.46) THRBCYP3A4TSHRPIK3CABRD4
SCHEMBL4058388 0.86 CD44 (0.48) THRBCYP3A4TSHRPIK3CABRD4
SCHEMBL2636943 0.86 THRB (0.71) THRBCYP3A4TSHRMMP2MAPT
SCHEMBL14454258 0.84 CES2 (0.52) THRBLMNATDP1KMT2AMEN1
SCHEMBL1189236 0.84 THRB (0.45) THRBCYP3A4TSHRPIK3CABRD4
SCHEMBL1188823 0.84 ALDH1A1 (0.50) THRBCYP3A4TSHRPIK3CAMAPT
SCHEMBL3790555 0.84 ALDH1A1 (0.54) THRBCYP3A4BRD4HSD17B10KDM4E
SCHEMBL27842733 0.83 THRB (0.47) THRBCYP3A4HSD17B10KDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120136703-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 CN disclosed
CN-120136704-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 CN disclosed
US-20220348698-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND, AS WELL AS METHOD FOR PRODUCING IODINE-CONTAINING VINYL POLYMER AND ACETYLATED DERIVATIVE THEREOF MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-11-03 US disclosed
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 WO disclosed
US-5006645-A Dying or printing wool, cotton, silk, leather and polyamide or polyurethane fibers CIBA-GEIGY CORPORATION (US) 1991-04-09 US disclosed
EP-0039054-B1 WATER-INSOLUBLE AZO DYES, PROCESS FOR THEIR PRODUCTION AND THEIR APPLICATION CASSELLA Aktiengesellschaft (DE) 1984-07-25 EP disclosed
EP-0014318-B1 REACTIVE DYESTUFFS, THEIR PREPARATION AND THEIR USE FOR DYEING MATERIALS CONTAINING HYDROXYL OR AMIDE GROUPS BAYER AG (DE) 1983-02-23 EP disclosed
EP-0063261-A2 Cationic azo dyestuffs, their preparation and their use BAYER AG (DE) 1982-10-27 EP disclosed
EP-0030028-A1 Process for printing synthetic, hydrophobic fibrous material according to the transfer printing principle CASSELLA Aktiengesellschaft (DE) 1981-06-10 EP disclosed
US-4036824-A Disazo dyestuffs containing A-O-alkylene-O-SO3 H group BAYER AKTIENGESELLSCHAFT (DT) 1977-07-19 US disclosed