Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | SLC22A6 | Q4U2R8 | 2/20 | 0.43 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.42 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.42 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.41 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.39 |
| ▸ | PPARG | P37231 | 6/20 | 0.39 |
| ▸ | PPARD | Q03181 | 6/20 | 0.39 |
| ▸ | PPARA | Q07869 | 6/20 | 0.39 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.39 |
| ▸ | TLR2 | O60603 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | FABP4 | P15090 | 2/20 | 0.39 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.39 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL157395 | 0.93 | ALDH1A1 (0.48) | TSHRALDH1A1LMNASLC22A6NFKB1 | |
| SCHEMBL986920 | 0.91 | ALDH1A1 (0.52) | TSHRALDH1A1LMNASLC22A6NFKB1 | |
| SCHEMBL21933577 | 0.89 | ALDH1A1 (0.41) | TSHRALDH1A1LMNASLC22A6NFKB1 | |
| SCHEMBL30955715 | 0.87 | AKR1B1 (0.41) | TSHRALDH1A1SLC22A6AKR1B1GPR84 | |
| SCHEMBL12410508 | 0.86 | NAALAD2 (0.43) | TSHRALDH1A1LMNASLC22A6NFKB1 | |
| SCHEMBL29807574 | 0.86 | ALDH1A1 (0.39) | TSHRALDH1A1LMNASLC22A6NFKB1 | |
| SCHEMBL11232780 | 0.82 | ALDH1A1 (0.39) | TSHRALDH1A1LMNATDP1 | |
| SCHEMBL31214626 | 0.80 | TSHR (0.58) | TSHRALDH1A1LMNAMEN1KMT2A | |
| SCHEMBL1623793 | 0.79 | TET2 (0.38) | TSHRALDH1A1LMNATDP1 | |
| SCHEMBL27567558 | 0.78 | TSHR (0.43) | TSHRALDH1A1LMNASLC22A6NFKB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 663 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240400951-A1 | COMPOSTION AND ITS USE IN CLEANING APPLICATIONS | INTELLIGENT FLUIDS GMBH (DE) | 2024-12-05 | — | — | US | claimed |
| EP-4408962-A1 | COMPOSITION AND ITS USE IN CLEANING APPLICATIONS | intelligent fluids GmbH (DE) | 2024-08-07 | — | — | EP | claimed |
| CN-118043441-A | Compositions and their use in cleaning applications | 智能流体有限公司 | 2024-05-14 | — | — | CN | claimed |
| EP-2781637-B1 | NONWOVEN FABRIC FORMED FROM FIBER COATED WITH ORGANIC BINDER POLYMER COMPOUND, ELECTROCHEMICAL DEVICE COMPRISING NONWOVEN FABRIC, AND METHOD FOR MANUFACTURING NONWOVEN FABRIC | LG ENERGY SOLUTION LTD (KR) | 2024-02-21 | — | — | EP | claimed |
| WO-2023170577-A1 | USE OF A HYDROPHOBIC POLYMER ON DECORATIVE PANELS AND METHOD | FLOORING INDUSTRIES LIMITED, SARL (LU) | 2023-09-14 | — | — | WO | claimed |
| WO-2023052548-A1 | COMPOSITION AND ITS USE IN CLEANING APPLICATIONS | INTELLIGENT FLUIDS GMBH (DE) | 2023-04-06 | — | — | WO | claimed |
| EP-4155376-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | claimed |
| EP-4155375-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | claimed |
| EP-3473783-B1 | METHOD FOR MANUFACTURING FLOOR BOARDS | ALADDIN MFG CORP (US) | 2020-07-08 | — | — | EP | claimed |
| US-20200183284-A1 | METHOD AND COMPOSITION FOR IMPROVING LWR IN PATTERNING STEP USING NEGATIVE TONE PHOTORESIST | YCCHEM CO., LTD. (KR) | 2020-06-11 | — | — | US | claimed |
| EP-2157477-B1 | USE OF A RESIST COMPOSITION FOR NEGATIVE WORKING-TYPE DEVELOPMENT, AND METHOD FOR PATTERN FORMATION USING THE RESIST COMPOSITION | FUJIFILM CORP (JP) | 2014-08-06 | — | — | EP | claimed |
| EP-1847878-B1 | PHOTOSENSITIVE COMPOSITION REMOVING LIQUID | SHOWA DENKO KK (JP) | 2012-10-31 | — | — | EP | claimed |
| US-8241840-B2 | Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method | FUJIFILM CORPORATION (JP) | 2012-08-14 | — | — | US | claimed |
| EP-2001289-B1 | AQUEOUS MICROEMULSIONS CONTAINING PYRETHROID COMPOUNDS | BASF SE (DE) | 2012-06-13 | — | — | EP | claimed |
| US-8034547-B2 | Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method | FUJIFILM CORPORATION (JP) | 2011-10-11 | — | — | US | claimed |
| US-20100330507-A1 | PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTERN FORMING METHOD, NEGATIVE DEVELOPING SOLUTION TO BE USED IN THE PATTERN FORMING METHOD AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT TO BE USED IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-12-30 | — | — | US | claimed |
| EP-1170343-B1 | INFRARED SENSITIVE COATING LIQUID | ASAHI KASEI CHEMICALS CORP (JP) | 2005-11-02 | — | — | EP | claimed |
| EP-1016698-B1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | MITSUBISHI RAYON CO (JP) | 2004-09-22 | — | — | EP | claimed |
| EP-0629671-B1 | Solvent composition | MITSUBISHI RAYON CO (JP) | 2002-03-27 | — | — | EP | claimed |
| EP-0260994-B1 | PROCESS FOR PRODUCING INTEGRATED CIRCUIT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-15 | — | — | EP | claimed |