Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.52 |
| ▸ | TSHR | P16473 | 6/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.50 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.50 |
| ▸ | GPR84 | Q9NQS5 | 8/20 | 0.46 |
| ▸ | PPARG | P37231 | 7/20 | 0.46 |
| ▸ | PPARD | Q03181 | 7/20 | 0.46 |
| ▸ | PPARA | Q07869 | 7/20 | 0.46 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.46 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.46 |
| ▸ | TLR2 | O60603 | 2/20 | 0.46 |
| ▸ | FABP4 | P15090 | 2/20 | 0.46 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.46 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.46 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | ESR1 | P03372 | 1/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL157395 | 0.98 | ALDH1A1 (0.48) | ALDH1A1TSHRLMNANFKB1PMP22 | |
| SCHEMBL984967 | 0.91 | TSHR (0.46) | ALDH1A1TSHRLMNANFKB1PMP22 | |
| SCHEMBL12410508 | 0.82 | NAALAD2 (0.43) | ALDH1A1TSHRLMNANFKB1PMP22 | |
| SCHEMBL21933577 | 0.81 | ALDH1A1 (0.41) | ALDH1A1TSHRLMNANFKB1PMP22 | |
| SCHEMBL19333419 | 0.80 | TSHR (0.46) | ALDH1A1TSHRLMNANFKB1PMP22 | |
| SCHEMBL30955715 | 0.80 | AKR1B1 (0.41) | ALDH1A1TSHRGPR84PPARGPPARD | |
| SCHEMBL10260231 | 0.80 | ACLY (0.49) | TSHRPPARGPPARATDP1FFAR1 | |
| SCHEMBL12141711 | 0.79 | ALDH1A1 (0.47) | ALDH1A1TSHRLMNANFKB1PMP22 | |
| SCHEMBL25307961 | 0.78 | TSHR (0.60) | ALDH1A1TSHRLMNANFKB1PMP22 | |
| SCHEMBL2832841 | 0.78 | TSHR (0.60) | ALDH1A1TSHRLMNANFKB1PMP22 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4621487-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING CURCUMIN DERIVATIVE | Nissan Chemical Corporation (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250109242-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM CONTAINING HYDROXYCINNAMIC ACID DERIVATIVE | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-03 | — | — | US | disclosed |
| WO-2024009993-A1 | METHOD OF MANUFACTURING LAMINATE AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT | 日産化学株式会社 | 2024-01-11 | — | — | WO | disclosed |
| CN-116547343-A | Composition for forming silicon-containing resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |
| CN-116547781-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-08-04 | — | — | CN | disclosed |
| CN-110850682-B | Positive photosensitive resin composition, insulating film, and image display device | 东友精细化工有限公司 | 2023-06-20 | — | — | CN | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| WO-2023074777-A1 | ADDITIVE-CONTAINING COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2023-05-04 | — | — | WO | disclosed |
| WO-2022138863-A1 | COMPOSITION FOR FORMING GAS BARRIER FILM, GAS BARRIER FILM AND METHOD FOR PRODUCING SAME | 日産化学株式会社 | 2022-06-30 | — | — | WO | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010041769-A1 | Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1142928-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR Corporation (JP) | 2001-10-10 | — | — | EP | disclosed |
| EP-0634696-B2 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-31 | — | — | EP | disclosed |
| US-6114086-A | COMPRISING ALKALI-SOLUBLE RESIN, DISSOLUTION CONTROLLING AGENTS, PHOTOACID GENERATOR, SOLVENT; USED FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES OR INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2000-09-05 | — | — | US | disclosed |
| US-5916729-A | A POSITIVE TONE TYPE REISTS CONSISTS OF A RESIN WHICH HAS AN ACIDIC FUNCTIONAL GROUP PROTECTED BY AN ACID DECOMPOSABLE GROUP AND IS HYDROLYZABLE, A PHOTOACID GENERATOR AND A SOLVENT MIXTURE OF ALKYL LACTATE WITH PROPYLENE GLYCOL ETHER | JSR CORPORATION (JP) | 1999-06-29 | — | — | US | disclosed |
| EP-0634696-B1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5629135-A | ALKALI-SOLUBLE RESIN, CROSSLINKER, PHOTOACID GENERATOR, SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0634696-A1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |