Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 6/20 | 0.46 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.46 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.46 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.44 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.43 |
| ▸ | PPARG | P37231 | 7/20 | 0.43 |
| ▸ | PPARD | Q03181 | 7/20 | 0.43 |
| ▸ | PPARA | Q07869 | 7/20 | 0.43 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.43 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.43 |
| ▸ | TLR2 | O60603 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | FABP4 | P15090 | 2/20 | 0.43 |
| ▸ | SLC22A6 | Q4U2R8 | 2/20 | 0.43 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | ESR1 | P03372 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL986920 | 0.98 | ALDH1A1 (0.52) | ALDH1A1LMNATSHRNFKB1PMP22 | |
| SCHEMBL984967 | 0.93 | TSHR (0.46) | ALDH1A1LMNATSHRNFKB1PMP22 | |
| SCHEMBL12410508 | 0.84 | NAALAD2 (0.43) | ALDH1A1LMNATSHRNFKB1PMP22 | |
| SCHEMBL21933577 | 0.83 | ALDH1A1 (0.41) | ALDH1A1LMNATSHRNFKB1PMP22 | |
| SCHEMBL30955715 | 0.81 | AKR1B1 (0.41) | ALDH1A1TSHRAKR1B1GPR84PPARG | |
| SCHEMBL29807574 | 0.80 | ALDH1A1 (0.39) | ALDH1A1LMNATSHRNFKB1PMP22 | |
| SCHEMBL29639025 | 0.79 | TDP1 (0.36) | ALDH1A1LMNATSHRTDP1KMT2A | |
| SCHEMBL21560981 | 0.79 | LMNA (0.44) | ALDH1A1LMNATSHRNFKB1PMP22 | |
| SCHEMBL19333419 | 0.78 | TSHR (0.46) | ALDH1A1LMNATSHRNFKB1PMP22 | |
| SCHEMBL27334341 | 0.78 | NFKB1 (0.45) | ALDH1A1LMNATSHRNFKB1PMP22 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 313 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-4804577-B2 | — | — | 2011-11-02 | — | — | JP | claimed |
| US-20100085518-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2010-04-08 | — | — | US | claimed |
| WO-2008102990-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2008-08-28 | — | — | WO | claimed |
| WO-2008078953-A1 | BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME | LG CHEM, LTD. (KR) | 2008-07-03 | — | — | WO | claimed |
| CN-122094772-A | Method for producing laminated film, and method for separating CO2 | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122094826-A | Method for producing laminate and method for separating CO2 | — | 2026-05-26 | — | — | CN | disclosed |
| EP-4621487-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING CURCUMIN DERIVATIVE | Nissan Chemical Corporation (JP) | 2025-09-24 | — | — | EP | disclosed |
| WO-2025120878-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE COLORING COMPOSITION, AND COLOR FILTER | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| WO-2025121031-A1 | COPOLYMER | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| WO-2025121034-A1 | RESIN COMPOSITION, MODIFIED RESIN COMPOSITION, AND METHOD FOR PRODUCING MODIFIED RESIN COMPOSITION | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| WO-2025121033-A1 | METHOD FOR PRODUCING COPOLYMER | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| WO-2025121032-A1 | RESIN COMPOSITION, MODIFIED RESIN COMPOSITION, AND METHOD FOR PRODUCING MODIFIED RESIN COMPOSITION | 株式会社レゾナック | 2025-06-12 | — | — | WO | disclosed |
| US-20010041769-A1 | Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1142928-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR Corporation (JP) | 2001-10-10 | — | — | EP | disclosed |
| EP-0634696-B2 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-31 | — | — | EP | disclosed |
| US-6114086-A | COMPRISING ALKALI-SOLUBLE RESIN, DISSOLUTION CONTROLLING AGENTS, PHOTOACID GENERATOR, SOLVENT; USED FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES OR INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2000-09-05 | — | — | US | disclosed |
| US-5916729-A | A POSITIVE TONE TYPE REISTS CONSISTS OF A RESIN WHICH HAS AN ACIDIC FUNCTIONAL GROUP PROTECTED BY AN ACID DECOMPOSABLE GROUP AND IS HYDROLYZABLE, A PHOTOACID GENERATOR AND A SOLVENT MIXTURE OF ALKYL LACTATE WITH PROPYLENE GLYCOL ETHER | JSR CORPORATION (JP) | 1999-06-29 | — | — | US | disclosed |
| EP-0634696-B1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5629135-A | ALKALI-SOLUBLE RESIN, CROSSLINKER, PHOTOACID GENERATOR, SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0634696-A1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |